SCHEMBL472875

SCHEMBL472875

O=C(O)N(C(=O)O)C1CCCCC1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39
ADH1A P07327 6/20 0.39
ALDH1A1 P00352 3/20 0.38
ADH1C P00326 4/20 0.38
ADH1B P00325 1/20 0.38
FDPS P14324 1/20 0.38
KDM4E B2RXH2 2/20 0.36
MEN1 O00255 2/20 0.36
KMT2A Q03164 2/20 0.36
NPC1 O15118 1/20 0.36
MITF O75030 1/20 0.36
RAB9A P51151 1/20 0.36
PAX8 Q06710 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
ATM Q13315 1/20 0.36
PHGDH O43175 1/20 0.36
NPSR1 Q6W5P4 1/20 0.35
MAPK1 P28482 1/20 0.35
EPHX1 P07099 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1957147 0.85 ALOX5 (0.41) CES2CES1ADH1AALDH1A1ADH1C
SCHEMBL7079485 0.85 PHGDH (0.40) CES2CES1ADH1AALDH1A1ADH1C
Hydrochloric Acid SCHEMBL11687151 0.84 ALDH1A1 (0.37) ADH1AALDH1A1ADH1CADH1BKDM4E
Hydrochloric Acid SCHEMBL11792406 0.84 ALDH1A1 (0.35) CES2CES1ADH1AALDH1A1ADH1C
SCHEMBL6685611 0.82 EPHX1 (0.42) SMN1; SMN2EPHX1
SCHEMBL6687963 0.82 NOS2 (0.34) CES2CES1ADH1AALDH1A1ADH1C
Hydrochloric Acid SCHEMBL11687306 0.80 ALDH1A1 (0.39) ADH1AALDH1A1ADH1CADH1BKDM4E
SCHEMBL2341412 0.79
SCHEMBL6684532 0.79 EPHX1 (0.48) ALDH1A1KDM4ENPC1RAB9ASMN1; SMN2
SCHEMBL754311 0.78 PHGDH (0.46) CES2CES1ADH1AALDH1A1ADH1C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10545424-B2 Liquid developer and method of producing liquid developer CANON KABUSHIKI KAISHA (JP) 2020-01-28 US disclosed
US-20190094734-A1 LIQUID DEVELOPER AND METHOD OF PRODUCING LIQUID DEVELOPER CANON KABUSHIKI KAISHA (JP) 2019-03-28 US disclosed
US-9568824-B2 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith FUJIFILM CORPORATION (JP) 2017-02-14 US disclosed
EP-2413191-B1 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith FUJIFILM CORP (JP) 2016-09-07 EP disclosed
US-9005870-B2 Actinic-ray- or radiation-sensitive resin composition and method of forming pattern using the composition FUJIFILM CORPORATION (JP) 2015-04-14 US disclosed
US-20120034559-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM THEREFROM AND METHOD OF FORMING PATTERN THEREWITH FUJIFILM CORPORATION (JP) 2012-02-09 US disclosed
EP-2413191-A1 Actinic-ray- or radiation-sensitive resin composition, resist film therefrom and method of forming pattern therewith Fujifilm Corporation (JP) 2012-02-01 EP disclosed
US-20110318693-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed
US-20110318691-A1 RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2011-12-29 US disclosed
US-20110183263-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION FUJIFILM CORPORATION (JP) 2011-07-28 US disclosed
CN-101218294-B Thermoplastic elastomer composition NOF CORP 2010-11-10 CN disclosed
CN-101218294-A Thermoplastic elastomer composition NOF CORP (JP) 2008-07-09 CN disclosed
US-7276484-B2 Dipeptide inhibitors of β-secretase ELAN PHARMACEUTICALS, INC. (US) 2007-10-02 US disclosed
US-20050182138-A1 Dipeptide inhibitors of beta-secretase ELAN PHARMACEUTICALS, INC. 2005-08-18 US disclosed
US-6864240-B1 Dipeptide inhibitors of β-secretase ELAN PHARMACEUTICALS, INC. (US) 2005-03-08 US disclosed
WO-2003060191-A2 NON-TOXIC CORROSION-PROTECTION CONVERSION COATINGES ABSED ON COBALT UNIVERSITY OF DAYTON (US) 2003-07-24 WO disclosed
US-6183934-B1 FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE KABUSHIKI KAISHA TOSHIBA (JP) 2001-02-06 US disclosed
US-4268618-A Bleaching composition for photographic processing FUJI PHOTO FILM CO., LTD. (JP) 1981-05-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20110318691-A1 RESIST COMPOSITION FOR SEMICONDUCTOR, AND RESIST FILM AND PATTERN FORMING METHOD USING THE SAME RIF1, MSI2, SLIRP CES2 3526/4885CES1 4750/4885ADH1A 4144/4885
US-20050182138-A1 Dipeptide inhibitors of beta-secretase BACE1, APP, BACE2 CES2 2049/4885CES1 597/4885ADH1A 4748/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.