Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 1/20 | 0.43 |
| ▸ | HDAC1 | Q13547 | 2/20 | 0.40 |
| ▸ | HDAC2 | Q92769 | 2/20 | 0.40 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.40 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.38 |
| ▸ | LMNA | P02545 | 3/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | DGKA | P23743 | 1/20 | 0.36 |
| ▸ | TSHR | P16473 | 2/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | PAM | P19021 | 2/20 | 0.33 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.32 |
| ▸ | RECQL | P46063 | 1/20 | 0.32 |
| ▸ | STING1 | Q86WV6 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4743537 | 1.00 | EPHX2 (0.43) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL4739473 | 1.00 | EPHX2 (0.43) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL4741052 | 0.98 | EPHX2 (0.41) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL3558406 | 0.91 | EPHX2 (0.39) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL27294030 | 0.91 | EPHX2 (0.39) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL7273803 | 0.89 | DGKA (0.46) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL3914424 | 0.89 | EPHX2 (0.49) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL2380206 | 0.89 | EPHX2 (0.49) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL20450540 | 0.89 | EPHX2 (0.49) | EPHX2HDAC1HDAC2HDAC6HDAC8 | |
| SCHEMBL14482131 | 0.89 | EPHX2 (0.49) | EPHX2HDAC1HDAC2HDAC6HDAC8 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | claimed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | claimed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | claimed |
| US-20080199805-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| WO-2008098189-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-14 | — | — | WO | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
| US-4889869-A | ANTIALDOSTERONISM AGENTS | CIBA-GEIGY CORPORATION (US) | 1989-12-26 | — | — | US | disclosed |
| US-4863903-A | RENIN ENZYME INHIBITORS, HYPOTENSIVE AGENTS | CIBA-GEIGY CORPORATION (US) | 1989-09-05 | — | — | US | disclosed |
| US-4758584-A | Antihypertensive 5-amino-4-hydroxyvaleryl derivatives substituted by sulphur-containing groups | CIBA-GEIGY CORPORATION (US) | 1988-07-19 | — | — | US | disclosed |
| US-4727060-A | HYPOTENSIVE AGENTS | CIBA-GEIGY CORPORATION (US) | 1988-02-23 | — | — | US | disclosed |
| US-4719288-A | HYPOTENSIVE | CIBA-GEIGY CORPORATION (US) | 1988-01-12 | — | — | US | disclosed |
| US-4613676-A | PEPTIDES | CIBA-GEIGY CORPORATION (US) | 1986-09-23 | — | — | US | disclosed |
| EP-0144290-A2 | Substituted ethylenediamine derivatives | CIBA-GEIGY AG (CH) | 1985-06-12 | — | — | EP | disclosed |
| EP-0143746-A2 | 5-Amino 4-hydroxy-valeryl-substituted derivatives | CIBA-GEIGY AG (CH) | 1985-06-05 | — | — | EP | disclosed |