SCHEMBL4743537

SCHEMBL4743537

[CH2]CCCCCCCC(=O)OC(C)(C)C

nearest known ligand 0.43

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
EPHX2 P34913 1/20 0.43
HDAC1 Q13547 2/20 0.40
HDAC2 Q92769 2/20 0.40
HDAC6 Q9UBN7 2/20 0.40
HDAC8 Q9BY41 2/20 0.38
LMNA P02545 3/20 0.37
ALDH1A1 P00352 1/20 0.37
DGKA P23743 1/20 0.36
TSHR P16473 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
PAM P19021 2/20 0.33
HDAC3 O15379 1/20 0.33
GAA P10253 1/20 0.32
MAPT P10636 1/20 0.32
MAPK1 P28482 1/20 0.32
RECQL P46063 1/20 0.32
STING1 Q86WV6 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4739770 1.00 EPHX2 (0.43) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL4739473 1.00 EPHX2 (0.43) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL4741052 0.98 EPHX2 (0.41) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL3558406 0.91 EPHX2 (0.39) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL27294030 0.91 EPHX2 (0.39) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL7273803 0.89 DGKA (0.46) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL3914424 0.89 EPHX2 (0.49) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL2380206 0.89 EPHX2 (0.49) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL20450540 0.89 EPHX2 (0.49) EPHX2HDAC1HDAC2HDAC6HDAC8
SCHEMBL14482131 0.89 EPHX2 (0.49) EPHX2HDAC1HDAC2HDAC6HDAC8

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1558654-A4 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF FUJIFILM ELECTRONIC MATERIALS (US) 2006-04-05 EP claimed
EP-1558654-A2 NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF Fujifilm Electronic Materials USA, Inc. (US) 2005-08-03 EP claimed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US claimed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US claimed
WO-2004040371-A2 NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF ARCH SPECIALTY CHEMICALS, INC. (US) 2004-05-13 WO claimed
CN-107027306-B 1- (cyclopent-2-en-1-yl) -3- (2-hydroxy-3- (arylsulfonyl) phenyl) urea derivatives as CXCR2 inhibitors 葛兰素史密斯克莱知识产权发展有限公司 2020-05-05 CN disclosed
CN-107847765-A The piperidine derivative of 1,4 substitutions 赛福伦公司 2018-03-27 CN disclosed
US-20080199805-A1 PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. 2008-08-21 US disclosed
WO-2008098189-A1 PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) 2008-08-14 WO disclosed
US-6916543-B2 Copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. (US) 2005-07-12 US disclosed
US-20040137362-A1 Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof ARCH SPECIALTY CHEMICALS, INC. 2004-07-15 US disclosed
EP-0400290-A1 5-Amino-4-hydroxyvalerianic acid derivatives useful as intermediates in the preparation of renin inhibitors CIBA-GEIGY AG (CH) 1990-12-05 EP disclosed
US-4863903-A RENIN ENZYME INHIBITORS, HYPOTENSIVE AGENTS CIBA-GEIGY CORPORATION (US) 1989-09-05 US disclosed
US-4778790-A HYPOTENSIVE AGENTS SANKYO COMPANY LIMITED (JP) 1988-10-18 US disclosed
US-4719288-A HYPOTENSIVE CIBA-GEIGY CORPORATION (US) 1988-01-12 US disclosed
US-4613676-A PEPTIDES CIBA-GEIGY CORPORATION (US) 1986-09-23 US disclosed
EP-0144290-A2 Substituted ethylenediamine derivatives CIBA-GEIGY AG (CH) 1985-06-12 EP disclosed
EP-0143746-A2 5-Amino 4-hydroxy-valeryl-substituted derivatives CIBA-GEIGY AG (CH) 1985-06-05 EP disclosed