Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSD | P07339 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2230540 | 0.75 | CTSD (0.43) | CTSD | |
| SCHEMBL28961651 | 0.67 | CTSD (0.38) | CTSD | |
| SCHEMBL514111 | 0.67 | CTSD (0.33) | CTSD | |
| Hydrochloric Acid SCHEMBL8069111 | 0.67 | CTSD (0.33) | CTSD | |
| SCHEMBL25223152 | 0.62 | CTSD (0.35) | CTSD | |
| SCHEMBL9860117 | 0.62 | CTSD (0.35) | CTSD | |
| SCHEMBL8500259 | 0.62 | CTSD (0.35) | CTSD | |
| SCHEMBL9860925 | 0.62 | CTSD (0.35) | CTSD | |
| SCHEMBL4652458 | 0.62 | CTSD (0.35) | CTSD | |
| SCHEMBL2851519 | 0.62 | CTSD (0.35) | CTSD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2008091396-A2 | THERMOELECTRIC NANOWIRE COMPOSITES | ELORET CORPORATION (US) | 2008-07-31 | — | — | WO | claimed |
| US-20080178921-A1 | THERMOELECTRIC NANOWIRE COMPOSITES | ELORET CORPORATION | 2008-07-31 | — | — | US | claimed |
| US-20250283217-A1 | VAPOR DEPOSITION SOURCE MATERIAL USED IN PRODUCTION OF FILM CONTAINING INDIUM AND ONE OR MORE OF THE OTHER METALS, AND THE METHOD OF PRODUCING FILM CONTAINING INDIUM AND ONE OR MORE OF THE OTHER METALS | KOJUNDO CHEMICAL LABORATORY CO., LTD. (JP) | 2025-09-11 | — | — | US | disclosed |
| US-12410514-B2 | Vapor deposition source material used in production of film containing indium and one or more of the other metals, and the method of producing film containing indium and one or more of the other metals | KOJUNDO CHEMICAL LABORATORY CO., LTD. (JP) | 2025-09-09 | — | — | US | disclosed |
| US-20250157808-A1 | METHODS AND APPARATUS UTILIZING INDIUM-BASED PRECURSORS FOR INTEGRATED CIRCUIT MANUFACTURING | INTEL CORPORATION | 2025-05-15 | — | — | US | disclosed |
| EP-4553577-A2 | METHODS AND APPARATUS UTILIZING INDIUM-BASED PRECURSORS FOR INTEGRATED CIRCUIT MANUFACTURING | INTEL Corporation (US) | 2025-05-14 | — | — | EP | disclosed |
| US-20240003004-A1 | VAPOR DEPOSITION SOURCE MATERIAL USED IN PRODUCTION OF FILM CONTAINING INDIUM AND ONE OR MORE OF THE OTHER METALS, AND THE METHOD OF PRODUCING FILM CONTAINING INDIUM AND ONE OR MORE OF THE OTHER METALS | KOJUNDO CHEMICAL LABORATORY CO., LTD. (JP) | 2024-01-04 | — | — | US | disclosed |
| US-8482104-B2 | Method for growth of indium-containing nitride films | SORAA, INC. (US) | 2013-07-09 | — | — | US | disclosed |
| US-20120199952-A1 | Method for Growth of Indium-Containing Nitride Films | SORAA, INC. (US) | 2012-08-09 | — | — | US | disclosed |
| WO-2008091396-A2 | THERMOELECTRIC NANOWIRE COMPOSITES | ELORET CORPORATION (US) | 2008-07-31 | — | — | WO | disclosed |
| US-20080178921-A1 | THERMOELECTRIC NANOWIRE COMPOSITES | ELORET CORPORATION | 2008-07-31 | — | — | US | disclosed |