Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | SLC6A3 | Q01959 | 8/20 | 0.34 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | MGLL | Q99685 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8199690 | 0.94 | LMNA (0.39) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL7999549 | 0.85 | MEN1 (0.39) | MEN1KMT2ALMNAPOLBSLC6A3 | |
| SCHEMBL6299545 | 0.83 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBEPHX2 | |
| SCHEMBL5521474 | 0.83 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBEPHX2 | |
| SCHEMBL10805179 | 0.83 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBSLC6A3 | |
| SCHEMBL3981084 | 0.81 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBEPHX2 | |
| SCHEMBL3812571 | 0.81 | CHRM2 (0.38) | MEN1KMT2ALMNAPOLBEPHX2 | |
| SCHEMBL5679436 | 0.81 | LMNA (0.38) | MEN1KMT2ALMNAPOLBALDH1A1 | |
| SCHEMBL901642 | 0.81 | MEN1 (0.38) | MEN1KMT2ALMNAPOLBEPHX2 | |
| SCHEMBL20357987 | 0.81 | CHRM2 (0.38) | MEN1KMT2ALMNAPOLBEPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | claimed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | claimed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | claimed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | claimed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | claimed |
| US-20080199805-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS. U.S.A., INC. | 2008-08-21 | — | — | US | disclosed |
| WO-2008098189-A1 | PHOTOSENSITIVE COMPOSITIONS EMPLOYING SILICON-CONTAINING ADDITIVES | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2008-08-14 | — | — | WO | disclosed |
| EP-1558654-A4 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | FUJIFILM ELECTRONIC MATERIALS (US) | 2006-04-05 | — | — | EP | disclosed |
| EP-1558654-A2 | NOVEL COPOLYMER, PHOTORESIST COMPOSITIONS THEREOF AND DEEP UV BILAYER SYSTEM THEREOF | Fujifilm Electronic Materials USA, Inc. (US) | 2005-08-03 | — | — | EP | disclosed |
| US-6916543-B2 | Copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. (US) | 2005-07-12 | — | — | US | disclosed |
| US-6899999-B2 | Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member | KABUSHIKI KAISHA TOSHIBA (JP) | 2005-05-31 | — | — | US | disclosed |
| US-20040137362-A1 | Novel copolymer, photoresist compositions thereof and deep UV bilayer system thereof | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-15 | — | — | US | disclosed |
| WO-2004040371-A2 | NOVEL COPOLYMER AND PHOTORESIST COMPOSITIONS THEREOF | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-05-13 | — | — | WO | disclosed |
| US-20030022102-A1 | Method of manufacturing composite member, photosensitive composition, porous base material, insulating body and composite member | KABUSHIKI KAISHA TOSHIBA (JP) | 2003-01-30 | — | — | US | disclosed |
| US-6086890-A | IMMUNOLOGY IN MAMMALS | UNIVERSITY OF SASKATCHEWAN (CA) | 2000-07-11 | — | — | US | disclosed |
| WO-2000021936-A1 | URACIL HERBICIDES | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-04-20 | — | — | WO | disclosed |