SCHEMBL474828

SCHEMBL474828

CCO[Si](C)(C)[SiH2]OC(C)=O

nearest known ligand 0.37

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.37
LMNA P02545 1/20 0.37
HSD17B10 Q99714 1/20 0.37
TSHR P16473 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL474610 0.71 ALDH1A1 (0.34) ALDH1A1LMNAHSD17B10
SCHEMBL9777935 0.69
SCHEMBL838934 0.65 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL728864 0.65 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL839014 0.65 ALDH1A1 (0.42) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL3910859 0.64 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL3912974 0.64 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL28085493 0.64 ALDH1A1 (0.40) ALDH1A1LMNAHSD17B10TSHR
Acetone SCHEMBL17157186 0.63 ALDH1A1 (0.43) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL960528 0.62 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3268997-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY Versum Materials US, LLC (US) 2018-01-17 EP claimed
WO-2016144960-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-09-15 WO claimed
EP-2412011-A1 CHEMICAL VAPOR DEPOSITION METHOD Tokyo Electron Limited (JP) 2012-02-01 EP claimed
WO-2010111313-A1 CHEMICAL VAPOR DEPOSITION METHOD TOKYO ELECTRON LIMITED (JP) 2010-09-30 WO claimed
US-20190304775-A1 Method and Precursors for Manufacturing 3D Devices VERSUM MATERIALS US, LLC (US) 2019-10-03 US disclosed
EP-3277696-A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS Versum Materials US, LLC (US) 2018-02-07 EP disclosed
EP-3268997-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY Versum Materials US, LLC (US) 2018-01-17 EP disclosed
WO-2016160800-A1 BORON-CONTAINING COMPOUNDS, COMPOSITIONS, AND METHODS FOR THE DEPOSITION OF BORON CONTAINING FILMS AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-10-06 WO disclosed
WO-2016144960-A1 PROCESS FOR DEPOSITING POROUS ORGANOSILICATE GLASS FILMS FOR USE AS RESISTIVE RANDOM ACCESS MEMORY AIR PRODUCTS AND CHEMICALS, INC. (US) 2016-09-15 WO disclosed
EP-2412011-A1 CHEMICAL VAPOR DEPOSITION METHOD Tokyo Electron Limited (JP) 2012-02-01 EP disclosed
WO-2010111313-A1 CHEMICAL VAPOR DEPOSITION METHOD TOKYO ELECTRON LIMITED (JP) 2010-09-30 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20190304775-A1 Method and Precursors for Manufacturing 3D Devices MEF2D, HTR3D, NSD3 ALDH1A1 4640/4885LMNA 3947/4885HSD17B10 3019/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.