⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL22203995 | 0.86 | ALDH1A1 (0.30) | — | |
| SCHEMBL11578060 | 0.79 | — | — | |
| SCHEMBL11259537 | 0.78 | ALDH1A1 (0.32) | — | |
| SCHEMBL474610 | 0.77 | ALDH1A1 (0.34) | — | |
| SCHEMBL74717 | 0.74 | ALDH1A1 (0.41) | — | |
| SCHEMBL22711080 | 0.72 | ALDH1A1 (0.39) | — | |
| SCHEMBL203137 | 0.71 | — | — | |
| SCHEMBL130980 | 0.69 | ALDH1A1 (0.37) | — | |
| Methane SCHEMBL205249 | 0.68 | ALDH1A1 (0.41) | — | |
| SCHEMBL10795711 | 0.67 | ALDH1A1 (0.35) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2412011-A1 | CHEMICAL VAPOR DEPOSITION METHOD | Tokyo Electron Limited (JP) | 2012-02-01 | — | — | EP | claimed |
| WO-2010111313-A1 | CHEMICAL VAPOR DEPOSITION METHOD | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | WO | claimed |
| EP-2412011-A1 | CHEMICAL VAPOR DEPOSITION METHOD | Tokyo Electron Limited (JP) | 2012-02-01 | — | — | EP | disclosed |
| WO-2010111313-A1 | CHEMICAL VAPOR DEPOSITION METHOD | TOKYO ELECTRON LIMITED (JP) | 2010-09-30 | — | — | WO | disclosed |
| US-20040241463-A1 | Mechanical enhancer additives for low dielectric films | VERSUM MATERIALS US, LLC | 2004-12-02 | — | — | US | disclosed |