SCHEMBL4753042

SCHEMBL4753042

CC(C)(C1CCC(OCC(O)COC2CCC(C(C)(C)C3CCC(OCC4CO4)CC3)CC2)CC1)C1CCC(OCC2CO2)CC1

nearest known ligand 0.45

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 5/20 0.45
KMT2A Q03164 5/20 0.45
HTT P42858 2/20 0.45
L3MBTL1 Q9Y468 1/20 0.44
SMN1; SMN2 Q16637 3/20 0.43
TSHR P16473 3/20 0.42
NPSR1 Q6W5P4 1/20 0.42
MAPT P10636 2/20 0.37
CYP2D6 P10635 1/20 0.37
LMNA P02545 1/20 0.36
GAA P10253 1/20 0.36
ALDH1A1 P00352 2/20 0.36
MAPK1 P28482 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15356260 1.00 MEN1 (0.45) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL13146717 0.96 MEN1 (0.42) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL4753133 0.93 MEN1 (0.42) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL19728213 0.92 MEN1 (0.40) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL18927063 0.92 MEN1 (0.43) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL17637044 0.88 HTT (0.58) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL17637043 0.88 HTT (0.58) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL18927062 0.88 MEN1 (0.40) MEN1KMT2AHTTL3MBTL1SMN1; SMN2
SCHEMBL17083647 0.87 ALDH1A1 (0.45) MEN1KMT2AHTTSMN1; SMN2TSHR
SCHEMBL50372 0.87 ALDH1A1 (0.45) MEN1KMT2AHTTSMN1; SMN2TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9865558-B2 Semiconductor device connected by anisotropic conductive film SAMSUNG SDI CO., LTD. (KR) 2018-01-09 US disclosed
US-20170298198-A1 AROMATIC POLYAMIDE FILMS FOR SOLVENT RESISTANT FLEXIBLE SUBSTRATES SUMITOMO BAKELITE CO., LTD. (JP) 2017-10-19 US disclosed
US-9399693-B2 Resin composition for photoimprinting, pattern forming process and etching mask MARUZEN PETROCHEMICAL CO., LTD. (JP) 2016-07-26 US disclosed
US-9399693-B2 Resin composition for photoimprinting, pattern forming process and etching mask MARUZEN PETROCHEMICAL CO., LTD. (JP) 2016-07-26 US disclosed
US-20160208096-A1 SOLUTION OF AROMATIC POLYAMIDE FOR PRODUCING DISPLAY ELEMENT, OPTICAL ELEMENT, ILLUMINATION ELEMENT OR SENSOR ELEMENT AKRON POLYMER SYSTEMS, INC. (US) 2016-07-21 US disclosed
US-20160163986-A1 CURABLE COMPOSITION AND ITS USE FOR ELECTRONIC DEVICE HENKEL AG & CO KGAA (DE) 2016-06-09 US disclosed
US-20160096925-A1 COVER MEMBER AND ELECTRONIC DEVICE AKRON POLYMER SYSTEMS INC. (US) 2016-04-07 US disclosed
US-20160064349-A1 SEMICONDUCTOR DEVICE CONNECTED BY ANISOTROPIC CONDUCTIVE FILM KUKDO CHEMICAL CO., LTD. (KR) 2016-03-03 US disclosed
US-20150232620-A1 CURABLE RESIN COMPOSITION, AND CURED PRODUCT THEREOF DAICEL CORPORATION (JP) 2015-08-20 US disclosed
US-20150232697-A1 SOLUTION OF AROMATIC POLYAMIDE FOR PRODUCING DISPLAY ELEMENT, OPTICAL ELEMENT, ILLUMINATION ELEMENT OR SENSOR ELEMENT AKRON POLYMER SYSTEMS, INC. (US) 2015-08-20 US disclosed
US-20130288021-A1 RESIN COMPOSITION FOR PHOTOIMPRINTING, PATTERN FORMING PROCESS AND ETCHING MASK MARUZEN PETROCHEMICAL CO., LTD. (JP) 2013-10-31 US disclosed
US-20130100210-A1 SEALANT, INKJET RECORDING HEAD USING SEALANT, AND METHOD FOR MANUFACTURING THE SAME CANON KABUSHIKI KAISHA (JP) 2013-04-25 US disclosed
US-20120115089-A1 PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2012-05-10 US disclosed
US-20120115089-A1 PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2012-05-10 US disclosed
US-20120115985-A1 PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2012-05-10 US disclosed
US-20120115985-A1 PROCESS FOR FORMING A HYDROPHILIC COATING AND HYDROPHILIC COATING, AND PROCESS FOR FORMING AN INK JET RECORDING HEAD AND INK JET RECORDING HEAD CANON KABUSHIKI KAISHA (JP) 2012-05-10 US disclosed
US-7588863-B2 Hologram recording method and hologram recording material FUJIFILM CORPORATION (JP) 2009-09-15 US disclosed
US-7582390-B2 Two-photon absorbing polymerization method, two-photon absorbing optical recording material and two-photon absorbing optical recording method FUJIFILM CORPORATION (JP) 2009-09-01 US disclosed
US-20070254149-A1 Decorative Coating ECKERT, HEIDI MARIE (AU) 2007-11-01 US disclosed
US-7171087-B2 Optical fiber cable HITACHI CABLE, LTD. (JP) 2007-01-30 US disclosed