Iodide

Iodide

SCHEMBL58886

[I-].c1ccc([S+](c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.38

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ACHECHRM1CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNG

The experimentally established mechanism targets of Iodide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE known ✓ P22303 1/20 0.33
ALDH1A1 P00352 4/20 0.38
TSHR P16473 5/20 0.35
TDP1 Q9NUW8 4/20 0.33
CA1 P00915 2/20 0.33
CA2 P00918 2/20 0.33
CA9 Q16790 2/20 0.33
ALOX12 P18054 2/20 0.33
APOBEC3A P31941 1/20 0.33
APOBEC3G Q9HC16 1/20 0.33
CA12 O43570 1/20 0.33
GLA P06280 1/20 0.33
CA3 P07451 1/20 0.33
CA4 P22748 1/20 0.33
CA14 Q9ULX7 1/20 0.33
LMNA P02545 1/20 0.33
CA7 P43166 1/20 0.33
HSD17B10 Q99714 2/20 0.32
MAPT P10636 1/20 0.32
HPGD P15428 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10801908 0.96 ALDH1A1 (0.40) ALDH1A1TSHRTDP1CA1CA2
SCHEMBL47554 0.96 ALDH1A1 (0.40) ALDH1A1TSHRTDP1CA1CA2
SCHEMBL126923 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA1CA2
Bromide SCHEMBL60557 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA1CA2
SCHEMBL2058664 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA1CA2
Fluoride Ion SCHEMBL10437963 0.92 ALDH1A1 (0.39) ALDH1A1TSHRTDP1CA1CA2
SCHEMBL12762137 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA1CA2
Methane SCHEMBL2440754 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA1CA2
Methane SCHEMBL3253432 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA1CA2
SCHEMBL2058661 0.92 ALDH1A1 (0.38) ALDH1A1TSHRTDP1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 694 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118434165-A Perovskite solar cell with excellent reverse bias stability and preparation method thereof 北京理工大学 2024-08-02 CN claimed
CN-118234268-A Perovskite battery structure, preparation method thereof and photovoltaic module 极电光能有限公司 2024-06-21 CN claimed
US-8759415-B2 Aromatic vinyl ether based reverse-tone step and flash imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2014-06-24 US claimed
EP-2371398-B1 MEDICAL SUPPLIES AND METHOD OF PRODUCING THE SAME PROSTEC CO LTD (JP) 2013-05-15 EP claimed
US-20120291668-A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-11-22 US claimed
US-8262961-B2 Aromatic vinyl ether based reverse-tone step and flash imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-09-11 US claimed
US-8128832-B2 Processes and materials for step and flash imprint lithography INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2012-03-06 US claimed
US-20080174051-A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY GLOBALFOUNDRIES INC. (KY) 2008-07-24 US claimed
US-20080169268-A1 PROCESSES AND MATERIALS FOR STEP AND FLASH IMPRINT LITHOGRAPHY GLOBALFOUNDRIES INC. (KY) 2008-07-17 US claimed
US-7358029-B2 Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution INTERNATIONAL BUSINESS MACHINES CORPORATION (US) 2008-04-15 US claimed
US-20070298176-A1 AROMATIC VINYL ETHER BASED REVERSE-TONE STEP AND FLASH IMPRINT LITHOGRAPHY GLOBALFOUNDRIES INC. (KY) 2007-12-27 US claimed
US-20070231734-A1 Polymer, a photoacid generator and a dissolution modification agent; patterning; image resolution GLOBALFOUNDRIES U.S. INC. 2007-10-04 US claimed
US-20070051697-A1 Processes and materials for step and flash imprint lithography GLOBALFOUNDRIES INC. (KY) 2007-03-08 US claimed
CN-122085599-A Composition, patterning method, formed pattern, semiconductor device and application thereof 2026-05-26 CN disclosed
CN-122085598-A Composition, patterning method, formed pattern, semiconductor device and application thereof 2026-05-26 CN disclosed
CN-122032829-A Method for applying ultraviolet curing adhesive on surface of porous substrate and porous substrate 江苏正力新能电池技术股份有限公司 2026-05-15 CN disclosed
US-4156046-A POLYEPOXIDES, EPOXY-TERMINATED SILANES MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1979-05-22 US disclosed
US-4111965-A FROM A CYCLIC CARBONATE SULFONIUM HALIDE CATALYST PHILLIPS PETROLEUM COMPANY (US) 1978-09-05 US disclosed
US-4101513-A ONIUM CATALYSTS OF GROUP 5A, 6A OR 7A ATOMS MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1978-07-18 US disclosed
US-4069234-A FROM CARBONATE ESTERS, PHOSPHONIUM, SULFONIUM, AND SULFOXONIUM HALIDES AND METAL SALT CATALYSTS PHILLIPS PETROLEUM COMPANY (US) 1978-01-17 US disclosed