Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 5/20 | 0.53 |
| ▸ | LMNA | P02545 | 2/20 | 0.53 |
| ▸ | TSHR | P16473 | 1/20 | 0.53 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.44 |
| ▸ | HPGD | P15428 | 2/20 | 0.44 |
| ▸ | CES2 | O00748 | 1/20 | 0.41 |
| ▸ | CES1 | P23141 | 1/20 | 0.41 |
| ▸ | NPC1 | O15118 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
| ▸ | POLB | P06746 | 2/20 | 0.37 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | HTT | P42858 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.37 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.37 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.37 |
| ▸ | RELA | Q04206 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL425893 | 1.00 | ACHE (0.53) | ACHELMNATSHRALOX12TDP1 | |
| Bromide SCHEMBL3139967 | 0.97 | ACHE (0.50) | ACHELMNATSHRALOX12TDP1 | |
| Iodide SCHEMBL2955653 | 0.97 | ACHE (0.50) | ACHELMNATSHRALOX12TDP1 | |
| Bromide SCHEMBL136724 | 0.97 | ACHE (0.50) | ACHELMNATSHRALOX12TDP1 | |
| Iodide SCHEMBL7090857 | 0.97 | ACHE (0.50) | ACHELMNATSHRALOX12TDP1 | |
| Hydrochloric Acid SCHEMBL5709632 | 0.97 | ACHE (0.50) | ACHELMNATSHRALOX12TDP1 | |
| P-Xylene SCHEMBL4152294 | 0.97 | ACHE (0.56) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL29968520 | 0.93 | ACHE (0.46) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL3144680 | 0.91 | ACHE (0.43) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL5403764 | 0.91 | ACHE (0.43) | ACHELMNATSHRALOX12TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3283 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4565378-B1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2026-05-06 | — | — | EP | claimed |
| EP-4565378-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2025-06-11 | — | — | EP | claimed |
| WO-2024028408-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | SICPA HOLDING SA (CH) | 2024-02-08 | — | — | WO | claimed |
| EP-4313430-A1 | METHODS FOR PRODUCING OPTICAL EFFECT LAYERS COMPRISING MAGNETIC OR MAGNETIZABLE PIGMENT PARTICLES AND EXHIBITING ONE OR MORE INDICIA | Sicpa Holding SA (CH) | 2024-02-07 | — | — | EP | claimed |
| CN-117098610-A | Method for producing an optical effect layer comprising magnetic or magnetizable pigment particles and exhibiting more than one marking | 锡克拜控股有限公司 | 2023-11-21 | — | — | CN | claimed |
| EP-3613070-B1 | PHOTOPATTERNABLE FILM | UNIV CHICAGO (US) | 2023-10-18 | — | — | EP | claimed |
| CN-110832618-B | Photoactive inorganic ligand-capped inorganic nanocrystals | 芝加哥大学 | 2023-09-12 | — | — | CN | claimed |
| US-11720017-B2 | Photoactive, inorganic ligand-capped inorganic nanocrystals | THE UNIVERSITY OF CHICAGO (US) | 2023-08-08 | — | — | US | claimed |
| CN-113929906-B | Self-crosslinkable isocyanurate polymer and anti-reflection coating composition, preparation method thereof and pattern forming method | 厦门恒坤新材料科技股份有限公司 | 2023-07-04 | — | — | CN | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | claimed |
| EP-1780199-B1 | Novel fluorohydroxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2012-02-01 | — | — | EP | claimed |
| EP-1780198-B1 | Novel fluorosulfonyloxyalkyl sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2011-10-05 | — | — | EP | claimed |
| EP-1736828-B1 | Photoresist monomer, polymer thereof and photoresist composition including the same | DONGJIN SEMICHEM CO LTD (KR) | 2010-11-24 | — | — | EP | claimed |
| EP-1314725-B1 | SULFONIUM SALT COMPOUND | WAKO PURE CHEM IND LTD (JP) | 2008-03-19 | — | — | EP | claimed |
| WO-2005057285-A1 | THERMAL CURABLE ONE-LIQUID TYPE EPOXY RESIN COMPOSITION FOR OVER-COAT | SAMYANGEMS CO., LTD. (KR) | 2005-06-23 | — | — | WO | claimed |
| EP-0955563-B1 | A photoresist composition | SUMITOMO CHEMICAL CO (JP) | 2003-03-19 | — | — | EP | claimed |
| US-6440634-B1 | MICROFABRICATION OF INTEGRATED CIRCUITS, DEEP UV LITHOGRAPHY; PHENYLSULFONATE SALTS OF SULFONIUM OR IODINIUM CATIONS | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2002-08-27 | — | — | US | claimed |
| EP-0821274-B1 | Chemical-sensitization resist composition | TOKYO OHKA KOGYO CO LTD (JP) | 2001-11-14 | — | — | EP | claimed |
| EP-0611813-B1 | One-component air-activatable polymerisable compositions containing onium salts | LOCTITE IRELAND LTD (IE) | 1998-12-30 | — | — | EP | claimed |