Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 3/20 | 0.50 |
| ▸ | LMNA | P02545 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.42 |
| ▸ | CES2 | O00748 | 1/20 | 0.39 |
| ▸ | CES1 | P23141 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 3/20 | 0.35 |
| ▸ | RAB9A | P51151 | 3/20 | 0.35 |
| ▸ | POLB | P06746 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | HTT | P42858 | 1/20 | 0.35 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.35 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.35 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.35 |
| ▸ | RELA | Q04206 | 1/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL3139967 | 1.00 | ACHE (0.50) | ACHELMNATSHRALOX12HPGD | |
| SCHEMBL425893 | 0.97 | ACHE (0.53) | ACHELMNATSHRALOX12HPGD | |
| SCHEMBL47574 | 0.97 | ACHE (0.53) | ACHELMNATSHRALOX12HPGD | |
| Hydrochloric Acid SCHEMBL5709632 | 0.95 | ACHE (0.50) | ACHELMNATSHRALOX12HPGD | |
| Iodide SCHEMBL7090857 | 0.95 | ACHE (0.50) | ACHELMNATSHRALOX12HPGD | |
| Iodide SCHEMBL2955653 | 0.95 | ACHE (0.50) | ACHELMNATSHRALOX12HPGD | |
| P-Xylene SCHEMBL4152294 | 0.95 | ACHE (0.56) | ACHELMNATSHRALOX12HPGD | |
| SCHEMBL29968520 | 0.90 | ACHE (0.46) | ACHELMNATSHRALOX12HPGD | |
| Bromide SCHEMBL4916423 | 0.89 | ACHE (0.53) | ACHELMNATSHRALOX12TDP1 | |
| SCHEMBL3144680 | 0.88 | ACHE (0.43) | ACHELMNATSHRALOX12HPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | JSR CORPORATION (JP) | 2025-11-27 | — | — | US | disclosed |
| WO-2024181434-A1 | RADIATION-SENSITIVE COMPOSITION, PATTERN FORMATION METHOD, AND RADIATION-SENSITIVE ACID GENERATION AGENT | JSR株式会社 | 2024-09-06 | — | — | WO | disclosed |
| EP-2060600-B1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO LTD (JP) | 2017-12-27 | — | — | EP | disclosed |
| EP-2093213-B1 | Positive resist composition and method of forming a resist pattern using the same | TOKYO OHKA KOGYO CO LTD (JP) | 2017-10-04 | — | — | EP | disclosed |
| US-8932795-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-01-13 | — | — | US | disclosed |
| EP-1676835-B1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | WAKO PURE CHEM IND LTD (JP) | 2014-12-10 | — | — | EP | disclosed |
| US-8765352-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-07-01 | — | — | US | disclosed |
| US-8541529-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-09-24 | — | — | US | disclosed |
| US-8323869-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-12-04 | — | — | US | disclosed |
| US-8283105-B2 | Positive resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-20090269700-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-10-29 | — | — | US | disclosed |
| US-20090226842-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-09-10 | — | — | US | disclosed |
| US-20090214982-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-27 | — | — | US | disclosed |
| EP-2093213-A1 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-26 | — | — | EP | disclosed |
| US-20090208871-A1 | NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-20 | — | — | US | disclosed |
| US-20090197197-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-08-06 | — | — | US | disclosed |
| US-20090130597-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-21 | — | — | US | disclosed |
| EP-2060600-A1 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2009-05-20 | — | — | EP | disclosed |
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2007-04-12 | — | — | US | disclosed |
| EP-1676835-A1 | PROCESS FOR PRODUCING TRIARYLSULFONIUM SALT | Wako Pure Chemical Industries, Ltd. (JP) | 2006-07-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070083060-A1 | for use as acid generator in semiconductor manufacture; triarylsulfonium salt having a structure that only one aromatic ring of three is different, in a high yield and by-product inhibition; reacting a diaryl sulfoxide with an aryl Grignard reagent in presence of chlorotrialkylsilane and strong acid | ARSA, HAO2, HAO1 | ACHE 1775/4885LMNA 4863/4885TSHR 1087/4885 |
| US-20250362596-A1 | RADIATION-SENSITIVE COMPOSITION, METHOD FOR FORMING PATTERN, AND RADIATION-SENSITIVE ACID GENERATOR | RAD1, RER1, RPA1 | ACHE 4387/4885LMNA 1859/4885TSHR 3932/4885 |
| US-20090130597-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | RER1, ASIC1, ABCC1 | ACHE 4404/4885LMNA 2281/4885TSHR 3085/4885 |
| US-20090208871-A1 | NOVEL COMPOUND AND METHOD OF PRODUCING SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | COASY, SLC11A2, AKR7A2 | ACHE 3336/4885LMNA 2100/4885TSHR 3997/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.