Known targets — ChEMBL curated mechanism
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
The experimentally established mechanism targets of Sulfuric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.79 |
| ▸ | CASP1 | P29466 | 4/20 | 0.54 |
| ▸ | TSHR | P16473 | 3/20 | 0.54 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.52 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.47 |
| ▸ | THRB | P10828 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | RECQL | P46063 | 2/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | TP53 | P04637 | 1/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | MEN1 | O00255 | 2/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.44 |
| ▸ | TNF | P01375 | 1/20 | 0.44 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.44 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.44 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Sulfuric Acid SCHEMBL9770168 | 1.00 | PDE10A (0.79) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| SCHEMBL33808 | 0.89 | — | — | |
| SCHEMBL9722982 | 0.89 | PDE10A (0.68) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL6518172 | 0.87 | PDE10A (0.95) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| Hydrochloric Acid SCHEMBL27589678 | 0.87 | PDE10A (0.95) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| Bromide SCHEMBL4051270 | 0.87 | PDE10A (0.95) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| Bromide SCHEMBL6648299 | 0.85 | PDE10A (0.91) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| Sulfuric Acid SCHEMBL1883126 | 0.83 | CASP1 (0.79) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| Sulfuric Acid SCHEMBL11515545 | 0.83 | ALDH1A1 (0.73) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 | |
| Dimethylamine SCHEMBL9109642 | 0.83 | PDE10A (0.86) | PDE10ACASP1TSHRL3MBTL1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 195 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-108832027-A | A kind of raising WOLED+COA manufacture of substrates | 广州市得胜光电科技有限公司 | 2018-11-16 | — | — | CN | claimed |
| CN-104259478-B | A kind of preparation method of nano silver wire | 南京欣益浩化学科技有限公司 | 2017-08-08 | — | — | CN | claimed |
| CN-104259478-A | Preparation method of silver nanowire | NANJING XINYIHAO CHEMICAL TECHNOLOGY CO LTD | 2015-01-07 | — | — | CN | claimed |
| US-20100021653-A1 | METHOD OF FORMING ELECTRICAL TRACES ON SUBSTRATE | FUKUI PRECISION COMPONENT (SHENZHEN) CO., LTD. (CN) | 2010-01-28 | — | — | US | claimed |
| CN-101636043-A | Method for manufacturing electric conduction line | FUKUI PREC COMPONENTS SHENZHEN | 2010-01-27 | — | — | CN | claimed |
| US-6521396-B2 | Developing a black and white high resolution film using a recommended liquid developer solution containing a reducing agent by increasing the pH of liquid developer and increasing the content of reducing agent in developer solution | HONG KONG POLYTECHNIC UNIVERSITY (HK) | 2003-02-18 | — | — | US | claimed |
| US-6277290-B1 | Process for recovering silver from photographic solutions | METAFIX INC. (CA) | 2001-08-21 | — | — | US | claimed |
| WO-2001044523-A1 | PROCESS FOR RECOVERING SILVER FROM PHOTOGRAPHIC SOLUTIONS | METAFIX INC. (CA) | 2001-06-21 | — | — | WO | claimed |
| US-4433050-A | Direct positive type light sensitive silver halide photographic material | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1984-02-21 | — | — | US | claimed |
| US-4278748-A | Absorbed hydrazide nucleating agents and photographic elements containing such agents | EASTMAN KODAK COMPANY (US) | 1981-07-14 | — | — | US | claimed |
| US-4276364-A | SILVER HALIDE GRAINS CAPABLE OF FORMING INTERNAL LATENT IMAGES | EASTMAN KODAK COMPANY (US) | 1981-06-30 | — | — | US | claimed |
| US-4217188-A | Method for storing developers | TEIJIN LTD. (JP) | 1980-08-12 | — | — | US | claimed |
| US-4140531-A | Light-handleable photographic materials | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1979-02-20 | — | — | US | claimed |
| US-4080207-A | Radiation-sensitive compositions and photographic elements containing N-(acylhydrazinophenyl) thioamide nucleating agents | EASTMAN KODAK COMPANY (US) | 1978-03-21 | — | — | US | claimed |
| US-4030925-A | Photographic compositions and elements including internal latent image silver halide grains and acylhydrazinophenylthiourea nucleating agents therefor | EASTMAN KODAK COMPANY (US) | 1977-06-21 | — | — | US | claimed |
| US-3935014-A | Direct-positive photographic emulsion containing, unfogged, monodispersed silver halide grains having a layered grain structure of specific silver chloride content | AGFA-GEVAERT AKTIENGESELLSCHAFT (DT) | 1976-01-27 | — | — | US | claimed |
| WO-2025110634-A1 | OXIDATIVE HAIR DYE COMPOSITION | 유씨엘 주식회사 | 2025-05-30 | — | — | WO | disclosed |
| US-12138330-B2 | Hair coloring modification additive and related methods | PWAI, LLC (US) | 2024-11-12 | — | — | US | disclosed |
| US-3940271-A | SILVER HALIDE EMULSION, 2-ALKYLMERCAPTO-IMIDAZOLINE | FUJI PHOTO FILM CO., LTD. (JA) | 1976-02-24 | — | — | US | disclosed |
| US-3935014-A | Direct-positive photographic emulsion containing, unfogged, monodispersed silver halide grains having a layered grain structure of specific silver chloride content | AGFA-GEVAERT AKTIENGESELLSCHAFT (DT) | 1976-01-27 | — | — | US | disclosed |