SCHEMBL476496

SCHEMBL476496

COc1c2[c]cccc2c(OC)c2ccccc12

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 4/20 0.60
ALDH1A1 P00352 4/20 0.60
SMN1; SMN2 Q16637 2/20 0.60
MAPK1 P28482 1/20 0.60
POLB P06746 1/20 0.44
CYP1A2 P05177 2/20 0.36
IDO1 P14902 2/20 0.36
CYP2C9 P11712 1/20 0.36
MCL1 Q07820 1/20 0.35
CYP2C19 P33261 1/20 0.34
CA4 P22748 2/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA14 Q9ULX7 1/20 0.31
ABCG2 Q9UNQ0 1/20 0.31
MAPT P10636 1/20 0.31
SLC2A1 P11166 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21830500 0.86 ALDH1A1 (0.44) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
SCHEMBL5028533 0.78 ERN1 (0.43) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
SCHEMBL52405 0.78 ALDH1A1 (1.00) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
SCHEMBL29366129 0.78 ALDH1A1 (1.00) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
Iodide SCHEMBL5967814 0.75 ALDH1A1 (0.94) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
SCHEMBL5026835 0.71 ALDH1A1 (0.47) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
SCHEMBL2409495 0.70 CYP2A6 (0.33) ALDH1A1SMN1; SMN2CYP1A2IDO1
SCHEMBL757747 0.70 KDM4E (0.82) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
SCHEMBL8859782 0.70 ALDH1A1 (0.82) KDM4EALDH1A1SMN1; SMN2MAPK1POLB
SCHEMBL1193385 0.69 EP300 (0.47) KDM4EALDH1A1SMN1; SMN2MAPK1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 348 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7244543-B2 Lithographic printing starting plate FUJIFILM CORPORATION (JP) 2007-07-17 US claimed
US-20050064340-A1 Lithographic printing starting plate FUJI PHOTO FILM CO., LTD. 2005-03-24 US claimed
EP-3640039-B1 LITHOGRAPHY ORIGINAL PLATE, PLATEMAKING METHOD FOR LITHOGRAPHY PLATE, AND PHOTOSENSITIVE RESIN COMPOSITION FUJIFILM CORP (JP) 2024-04-24 EP disclosed
EP-3754428-B1 DEVELOPMENT PROCESSING DEVICE FOR PLANOGRAPHIC PRINTING PLATE MANUFACTURE, AND MANUFACTURING METHOD OF PLANOGRAPHIC PRINTING PLATE FUJIFILM CORP (JP) 2024-04-17 EP disclosed
EP-3730308-B1 PLANOGRAPHIC PRINTING PLATE PRECURSOR AND METHOD OF PRODUCING PLANOGRAPHIC PRINTING PLATE FUJIFILM CORP (JP) 2024-02-28 EP disclosed
EP-3543790-B1 PLANOGRAPHIC PRINTING PLATE PRECURSOR, AND ON-PRESS PLATE-MAKING METHOD FOR A PLANOGRAPHIC PRINTING PLATE FUJIFILM CORP (JP) 2023-12-13 EP disclosed
EP-3838594-B1 LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, LITHOGRAPHIC PRINTING PLATE PRECURSOR LAMINATE, AND LITHOGRAPHIC PRINTING METHOD FUJIFILM CORP (JP) 2023-11-22 EP disclosed
EP-4275910-A2 LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING SAME, LITHOGRAPHIC PRINTING PLATE PRECURSOR LAMINATE, AND LITHOGRAPHIC PRINTING METHOD FUJIFILM Corporation (JP) 2023-11-15 EP disclosed
CN-112771020-B Process for producing dicarboxylic acid monoester 富士胶片株式会社 2023-11-07 CN disclosed
CN-112789178-B Original printing plate, laminate thereof, plate making method of printing plate, and printing method 富士胶片株式会社 2023-10-20 CN disclosed
CN-116917265-A Process for producing dicarboxylic acid monoester 富士胶片和光纯药株式会社 2023-10-20 CN disclosed
US-20030108811-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2003-06-12 US disclosed
EP-1296190-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-03-26 EP disclosed
EP-1273969-A2 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2003-01-08 EP disclosed
US-20020168584-A1 Photopolymerization using acid generator FUJI PHOTO FILM CO., LTD. 2002-11-14 US disclosed
EP-1243968-A2 Positive resist composition FUJI PHOTO FILM CO., LTD. (JP) 2002-09-25 EP disclosed
US-20020061464-A1 Positive resist composition FUJI PHOTO FILM CO., LTD. 2002-05-23 US disclosed
US-6383714-B1 COMPOUNDS DECOMPOSABLE BY LIGHT AND HEAT, CROSSLINKING, INFRARED ABSORBERS FUJI PHOTO FILM CO., LTD. (JP) 2002-05-07 US disclosed
EP-1164127-A1 PROCESS FOR PRODUCING ONIUM SALT DERIVATIVE AND NOVEL ONIUM SALT DERIVATIVE Toyo Gosei Kogyo Co., Ltd. (JP) 2001-12-19 EP disclosed
EP-1059164-A2 Image recording material and planographic printing plate using same FUJI PHOTO FILM CO., LTD. (JP) 2000-12-13 EP disclosed