Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPBAR1 | Q8TDU6 | 7/20 | 0.73 |
| ▸ | VDR | P11473 | 5/20 | 0.73 |
| ▸ | CASP7 | P55210 | 3/20 | 0.73 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.73 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.73 |
| ▸ | EPHA2 | P29317 | 3/20 | 0.73 |
| ▸ | TP53 | P04637 | 2/20 | 0.73 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.73 |
| ▸ | BLM | P54132 | 2/20 | 0.73 |
| ▸ | NR1H4 | Q96RI1 | 2/20 | 0.73 |
| ▸ | AKR1B10 | O60218 | 2/20 | 0.73 |
| ▸ | AKR1B1 | P15121 | 2/20 | 0.73 |
| ▸ | LMNA | P02545 | 2/20 | 0.73 |
| ▸ | USP2 | O75604 | 2/20 | 0.73 |
| ▸ | MDM4 | O15151 | 1/20 | 0.73 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.73 |
| ▸ | MAPT | P10636 | 1/20 | 0.73 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.73 |
| ▸ | TSHR | P16473 | 1/20 | 0.73 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.73 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL476518 | 1.00 | GPBAR1 (0.73) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL235607 | 0.89 | GPBAR1 (0.77) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL235606 | 0.89 | GPBAR1 (0.77) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL26670009 | 0.89 | GPBAR1 (0.77) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL1697153 | 0.88 | GPBAR1 (0.76) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL1697152 | 0.88 | GPBAR1 (0.76) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL4281815 | 0.87 | GPBAR1 (0.69) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL8037712 | 0.87 | OSBP (0.58) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL5577556 | 0.86 | GPBAR1 (0.73) | GPBAR1VDRCASP7HSD17B10TDP1 | |
| SCHEMBL5577551 | 0.86 | GPBAR1 (0.73) | GPBAR1VDRCASP7HSD17B10TDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | disclosed |
| WO-2021241246-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR株式会社 | 2021-12-02 | — | — | WO | disclosed |
| CN-113363141-A | Photoresist composition and method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2021-09-07 | — | — | CN | disclosed |
| WO-2021140909-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2021-07-15 | — | — | WO | disclosed |
| WO-2021131845-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR株式会社 | 2021-07-01 | — | — | WO | disclosed |
| WO-2021065350-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN USING SAME | JSR株式会社 | 2021-04-08 | — | — | WO | disclosed |
| WO-2020241277-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND COMPOUND | JSR株式会社 | 2020-12-03 | — | — | WO | disclosed |
| WO-2020195428-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2020-10-01 | — | — | WO | disclosed |
| WO-2020008994-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2020-01-09 | — | — | WO | disclosed |
| EP-2192134-B1 | PHOTOSENSITIVE COMPOSITION, PATTERN-FORMING METHOD USING THE PHOTOSENSITIVE COMPOSITION, AND COMPOUND USED IN THE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORP (JP) | 2014-02-26 | — | — | EP | disclosed |
| EP-2194073-B1 | Positive-working photosensitive composition, method for pattern formation using the composition, resin for use in the composition, and monomer. | FUJIFILM CORP (JP) | 2013-06-05 | — | — | EP | disclosed |
| EP-2034361-B1 | Compound for use in a photosensitive composition | FUJIFILM CORP (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-2194073-A1 | POSITIVE-WORKING PHOTOSENSITIVE COMPOSITION, METHOD FOR PATTERN FORMATION USING THE COMPOSITION, AND RESIN FOR USE IN THE COMPOSITION | Fujifilm Corporation (JP) | 2010-06-09 | — | — | EP | disclosed |
| EP-2034361-A2 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | Fujifilm Corporation (JP) | 2009-03-11 | — | — | EP | disclosed |
| EP-2003509-A2 | Pattern forming method | FUJIFILM Corporation (JP) | 2008-12-17 | — | — | EP | disclosed |
| EP-1767992-A1 | Positive resist composition for immersion exposure and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-03-28 | — | — | EP | disclosed |
| EP-1736824-A2 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | Fuji Photo Film Co., Ltd. (JP) | 2006-12-27 | — | — | EP | disclosed |
| EP-1688791-A2 | Photosensitive composition, compound for use in the photosensitive composition and pattern forming method using the photosensitive composition | Fuji Photo Film Co., Ltd. (JP) | 2006-08-09 | — | — | EP | disclosed |
| US-6258508-B1 | PHOTORESISTS | KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) | 2001-07-10 | — | — | US | disclosed |
| US-6013413-A | Alicyclic nortricyclene polymers and co-polymers | CORNELL RESEARCH FOUNDATION, INC. (US) | 2000-01-11 | — | — | US | disclosed |