SCHEMBL4281815

SCHEMBL4281815

C[C@H](CCC(=O)O)[C@H]1CC[C@H]2[C@@H]3CC[C@@H]4C[C@H](O)CC(C(C)(C)C)[C@]4(C)[C@H]3C[C@H](O)[C@]12C

nearest known ligand 0.69

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPBAR1 Q8TDU6 11/20 0.69
NR1H4 Q96RI1 4/20 0.69
PDE3A Q14432 2/20 0.69
TBXA2R P21731 1/20 0.69
SLC10A2 Q12908 1/20 0.69
MAPT P10636 3/20 0.56
MAPK1 P28482 3/20 0.56
USP2 O75604 2/20 0.56
LMNA P02545 2/20 0.56
MEN1 O00255 1/20 0.56
KMT2A Q03164 1/20 0.56
CYP3A4 P08684 2/20 0.55
CASP7 P55210 3/20 0.55
TP53 P04637 2/20 0.55
HSD17B10 Q99714 2/20 0.55
BLM P54132 2/20 0.55
TDP1 Q9NUW8 2/20 0.55
MDM4 O15151 1/20 0.55
HSPD1 P10809 1/20 0.55
VDR P11473 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21594795 0.91 GPBAR1 (0.76) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL7756845 0.91 GPBAR1 (0.76) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL1654288 0.91 GPBAR1 (0.76) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL3447484 0.91 GPBAR1 (0.76) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL21631677 0.91 GPBAR1 (0.76) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL7996290 0.88 GPBAR1 (0.72) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL476519 0.87 GPBAR1 (0.73) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL476518 0.87 GPBAR1 (0.73) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL1635362 0.87 GPBAR1 (0.71) GPBAR1NR1H4PDE3ATBXA2RSLC10A2
SCHEMBL759713 0.86 GPBAR1 (0.71) GPBAR1NR1H4PDE3ATBXA2RSLC10A2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2296039-B1 Positive photosensitive composition FUJIFILM CORP (JP) 2013-09-25 EP claimed
CN-113363141-A Photoresist composition and method for manufacturing semiconductor device 台湾积体电路制造股份有限公司 2021-09-07 CN disclosed
CN-110609441-A Method for forming photoresist pattern 台湾积体电路制造股份有限公司 2019-12-24 CN disclosed
EP-1961739-B1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION JSR CORP (JP) 2012-10-17 EP disclosed
US-8273837-B2 Compound, polymer, and resin composition JSR CORPORATION (JP) 2012-09-25 US disclosed
US-20090318652-A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION JSR CORPORATION (JP) 2009-12-24 US disclosed
US-20090305161-A1 LIQUID IMMERSION LITHOGRAPHY JSR CORPORATION (JP) 2009-12-10 US disclosed
US-7615337-B2 Photoactive resist capping layer INTEL CORPORATION (US) 2009-11-10 US disclosed
EP-1961739-A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION JSR Corporation (JP) 2008-08-27 EP disclosed
EP-1953595-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
EP-1035437-B1 A radiation-sensitive resist material and a process for device fabrication using the same LUCENT TECHNOLOGIES INC (US) 2002-03-27 EP disclosed
US-6296984-B1 PHOTORESISTS LIGHT SENSITIVE LAYERS ON A SUBSTRATE WITH CHROMOPHORE OF IODINIUM AND SULFONIUM GROUPS AGERE SYSTEMS GUARDIAN CORP. 2001-10-02 US disclosed
US-6258508-B1 PHOTORESISTS KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2001-07-10 US disclosed
EP-1035437-A2 A radiation-sensitive resist material and a process for device fabrication using the same LUCENT TECHNOLOGIES INC. (US) 2000-09-13 EP disclosed
US-6013413-A Alicyclic nortricyclene polymers and co-polymers CORNELL RESEARCH FOUNDATION, INC. (US) 2000-01-11 US disclosed
US-5998099-A Energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material LUCENT TECHNOLOGIES INC. (US) 1999-12-07 US disclosed
EP-0880074-B1 An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material LUCENT TECHNOLOGIES INC (US) 1999-10-27 EP disclosed
EP-0907109-A1 Process for device fabrication using a radiation-sensitive resist material LUCENT TECHNOLOGIES INC. (US) 1999-04-07 EP disclosed
US-5879857-A POLYMER, PHOTOACID GENERATOR, DISSOLUTION INHIBITOR LUCENT TECHNOLOGIES INC. (US) 1999-03-09 US disclosed
EP-0880074-A1 An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material LUCENT TECHNOLOGIES INC. (US) 1998-11-25 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090318652-A1 NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION ERCC4, RAD51, RTF1 GPBAR1 4323/4885NR1H4 2361/4885PDE3A 3306/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.