Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AHR | P35869 | 1/20 | 0.48 |
| ▸ | ATP4A | P20648 | 10/20 | 0.43 |
| ▸ | ATP4B | P51164 | 10/20 | 0.43 |
| ▸ | TUBB4A | P04350 | 1/20 | 0.42 |
| ▸ | TUBB | P07437 | 1/20 | 0.42 |
| ▸ | TUBA3C | P0DPH7 | 1/20 | 0.42 |
| ▸ | TUBA1B | P68363 | 1/20 | 0.42 |
| ▸ | TUBA4A | P68366 | 1/20 | 0.42 |
| ▸ | TUBB4B | P68371 | 1/20 | 0.42 |
| ▸ | TUBB3 | Q13509 | 1/20 | 0.42 |
| ▸ | TUBB2A | Q13885 | 1/20 | 0.42 |
| ▸ | TUBB8 | Q3ZCM7 | 1/20 | 0.42 |
| ▸ | TUBA3E | Q6PEY2 | 1/20 | 0.42 |
| ▸ | TUBA1A | Q71U36 | 1/20 | 0.42 |
| ▸ | TUBA1C | Q9BQE3 | 1/20 | 0.42 |
| ▸ | TUBB6 | Q9BUF5 | 1/20 | 0.42 |
| ▸ | TUBB2B | Q9BVA1 | 1/20 | 0.42 |
| ▸ | TUBB1 | Q9H4B7 | 1/20 | 0.42 |
| ▸ | CHRNA7 | P36544 | 3/20 | 0.41 |
| ▸ | CHRNA10 | Q9GZZ6 | 3/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL547497 | 1.00 | AHR (0.48) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL144241 | 0.97 | AHR (0.50) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL144242 | 0.97 | AHR (0.50) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL12595134 | 0.93 | AHR (0.44) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL1005700 | 0.92 | TUBB4A (0.50) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL4956020 | 0.92 | TUBB4A (0.50) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL6276597 | 0.88 | AHR (0.39) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL15318520 | 0.88 | AHR (0.44) | AHRATP4AATP4BTUBB4ATUBB | |
| SCHEMBL8087287 | 0.87 | PPARA (0.41) | AHRCHRNA7 | |
| SCHEMBL1629063 | 0.86 | RELA (0.53) | AHRTUBB4ATUBBTUBA3CTUBA1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 367 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | disclosed |
| WO-2026100662-A1 | LIQUID CRYSTAL ALIGNING AGENT AND LIQUID CRYSTAL DISPLAY ELEMENT | 日産化学株式会社 | 2026-05-15 | — | — | WO | disclosed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | disclosed |
| WO-2025127098-A1 | PHASE DIFFERENCE FILM COMPOSITION AND SINGLE-LAYER PHASE DIFFERENCE MATERIAL | 日産化学株式会社 | 2025-06-19 | — | — | WO | disclosed |
| CN-119866360-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-22 | — | — | CN | disclosed |
| US-12281235-B2 | Photocurable composition, inkjet ink composition, active energy ray-curable ink composition, cured product, and electronic component | JNC CORPORATION (JP) | 2025-04-22 | — | — | US | disclosed |
| CN-119856108-A | Liquid crystal aligning agent and liquid crystal display element | 日产化学株式会社 | 2025-04-18 | — | — | CN | disclosed |
| CN-119768473-A | Polymer composition and single layer phase difference material | 日产化学株式会社 | 2025-04-04 | — | — | CN | disclosed |
| CN-116323702-B | Method for producing single-layer phase difference material | 日产化学株式会社 | 2025-04-01 | — | — | CN | disclosed |
| EP-0856773-B1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | EP | disclosed |
| US-6245478-B1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-06-12 | — | — | US | disclosed |
| US-6239231-B1 | HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS | SUMITOMO CHEMICAL, COMPANY LIMITED (JP) | 2001-05-29 | — | — | US | disclosed |
| US-6183934-B1 | FOE USE IN FORMATION OF PATTERN OF INSULATION FILM, PASSIVATION FILM, .ALPHA.-RAY SHIELDING FILM, OPTICAL WAVEGUIDE | KABUSHIKI KAISHA TOSHIBA (JP) | 2001-02-06 | — | — | US | disclosed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | disclosed |
| EP-0917000-A2 | Positive resist composition and method for forming a resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1999-05-19 | — | — | EP | disclosed |
| EP-0856773-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-08-05 | — | — | EP | disclosed |
| EP-0165006-A2 | Processes for preparing substituted halomethyl-s-triazines | Polychrome Corporation (US) | 1985-12-18 | — | — | EP | disclosed |
| US-4559401-A | Process for preparing chromophore-substituted vinyl-halomethyl-s-triazines | POLYCHROME CORPORATION (US) | 1985-12-17 | — | — | US | disclosed |