SCHEMBL4771092

SCHEMBL4771092

CC(C)c1cc(C(C)C)c([S+](c2ccccc2)c2ccccc2)c(C(C)C)c1.O=S(=O)([O-])c1c(F)c(F)c(F)c(F)c1F

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FABP4 P15090 3/20 0.37
FABP3 P05413 2/20 0.37
FABP5 Q01469 1/20 0.37
ENPP3 O14638 1/20 0.34
ENPP1 P22413 1/20 0.34
NR3C1 P04150 1/20 0.33
PSEN1 P49768 1/20 0.32
PSEN2 P49810 1/20 0.32
APH1B Q8WW43 1/20 0.32
NCSTN Q92542 1/20 0.32
APH1A Q96BI3 1/20 0.32
PSENEN Q9NZ42 1/20 0.32
GAA P10253 1/20 0.32
DPP8 Q6V1X1 1/20 0.31
KAT6A Q92794 2/20 0.31
TDP1 Q9NUW8 1/20 0.31
SOAT2 O75908 1/20 0.31
MYC P01106 1/20 0.31
SOAT1 P35610 1/20 0.31
MAP2K3 P46734 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4773393 0.89 FABP3 (0.36) FABP4FABP3FABP5NR3C1PSEN1
SCHEMBL4777596 0.86 FABP3 (0.35) FABP4FABP3FABP5PSEN1PSEN2
SCHEMBL4779708 0.84 FABP3 (0.35) FABP4FABP3FABP5NR3C1PIK3CD
SCHEMBL5412191 0.83 KAT6A (0.38) GAAKAT6ATDP1HTT
SCHEMBL383991 0.83 FABP4 (0.47) FABP4FABP3FABP5ENPP3ENPP1
SCHEMBL4778703 0.82 FABP3 (0.33) FABP4FABP3FABP5NR3C1
SCHEMBL4771740 0.81 RECQL (0.34) FABP4FABP3FABP5PSEN1PSEN2
SCHEMBL4778859 0.81 FABP3 (0.41) FABP4FABP3FABP5NR3C1
SCHEMBL4779461 0.81 HSD11B1 (0.37) FABP4FABP3FABP5GAAHTT
SCHEMBL2634746 0.79 FABP4 (0.39) FABP4FABP3FABP5ENPP3ENPP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed