SCHEMBL4773393

SCHEMBL4773393

CC(C)c1cc(C(C)C)c([S+](c2ccccc2)c2ccccc2)c(C(C)C)c1.O=S(=O)([O-])c1c(F)cccc1F

nearest known ligand 0.36

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
FABP3 P05413 2/20 0.36
FABP4 P15090 2/20 0.36
FABP5 Q01469 1/20 0.36
KAT6A Q92794 2/20 0.32
NR3C1 P04150 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
PKM P14618 2/20 0.32
PKLR P30613 1/20 0.31
SOAT2 O75908 1/20 0.30
MYC P01106 1/20 0.30
SOAT1 P35610 1/20 0.30
MAP2K3 P46734 1/20 0.30
PSEN1 P49768 1/20 0.30
PSEN2 P49810 1/20 0.30
APH1B Q8WW43 1/20 0.30
NCSTN Q92542 1/20 0.30
APH1A Q96BI3 1/20 0.30
PSENEN Q9NZ42 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4771092 0.89 FABP4 (0.37) FABP3FABP4FABP5KAT6ANR3C1
SCHEMBL4777596 0.85 FABP3 (0.35) FABP3FABP4FABP5PKMPSEN1
SCHEMBL4779708 0.83 FABP3 (0.35) FABP3FABP4FABP5NR3C1
SCHEMBL4771740 0.82 RECQL (0.34) FABP3FABP4FABP5PSEN1PSEN2
SCHEMBL383991 0.82 FABP4 (0.47) FABP3FABP4FABP5NR3C1TDP1
SCHEMBL4778703 0.81 FABP3 (0.33) FABP3FABP4FABP5NR3C1
SCHEMBL4778859 0.80 FABP3 (0.41) FABP3FABP4FABP5NR3C1
SCHEMBL4779461 0.80 HSD11B1 (0.37) FABP3FABP4FABP5
SCHEMBL2634746 0.78 FABP4 (0.39) FABP3FABP4FABP5NR3C1TDP1
SCHEMBL3194861 0.78 PKM (0.36) KAT6ATDP1PKMPKLR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8206888-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2012-06-26 US disclosed
EP-1953593-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR Corporation (JP) 2008-08-06 EP disclosed
US-7060414-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2006-06-13 US disclosed
US-6899989-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-05-31 US disclosed