SCHEMBL4772898

SCHEMBL4772898

C=C(C)C(=O)OC1C2CC3C(=O)OC1C3C2.C=C(C)C(=O)OCC[Si]([Si](C)(C)C)([Si](C)(C)C)[Si](C)(C)C

nearest known ligand 0.31

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL22840948 0.88 KDM4E (0.31)
SCHEMBL13088042 0.88 KDM4E (0.31)
SCHEMBL19719271 0.88 KDM4E (0.31)
SCHEMBL9975636 0.88 KDM4E (0.31)
SCHEMBL47307 0.88 KDM4E (0.31)
SCHEMBL15166539 0.88 KDM4E (0.31)
SCHEMBL12727210 0.86 ALDH1A1 (0.32) ALDH1A1
SCHEMBL1697120 0.85 ALDH1A1 (0.32) ALDH1A1
SCHEMBL14867145 0.84 ALDH1A1 (0.30) ALDH1A1
SCHEMBL16605692 0.84 ALDH1A1 (0.33) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1236745-B1 Silicon-containing polymer, resist composition and patterning process SHINETSU CHEMICAL CO (JP) 2008-07-23 EP disclosed
US-6492089-B2 POLYMER BEARING CYCLIC SILICON-CONTAINING GROUPS SUCH AS 1,4,4-TRIMETHYL-4-SILACYCLOHEXYL METHACRYLATE; USE AS CHEMICALLY AMPLIFIED POSITIVE RESIST SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-12-10 US disclosed
EP-1236745-A2 Silicon-containing polymer, resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2002-09-04 EP disclosed
US-20010003772-A1 Polymer, resist composition and patterning process SHIN-ETSU CHEMICDL CO., LTD. OF (JP) 2001-06-14 US disclosed