SCHEMBL4782239

SCHEMBL4782239

Nc1ccc(C(=O)c2ccccc2)c(-c2ccccc2)c1Oc1ccccc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CCNE2 O96020 1/20 0.48
CCNE1 P24864 1/20 0.48
CDK2 P24941 1/20 0.48
MAPT P10636 3/20 0.46
GAA P10253 1/20 0.46
POLB P06746 2/20 0.44
ALDH1A1 P00352 3/20 0.42
LMNA P02545 3/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
USP2 O75604 1/20 0.42
GLA P06280 1/20 0.42
HSD17B10 Q99714 1/20 0.42
MAPK14 Q16539 3/20 0.42
ADORA1 P30542 1/20 0.41
HDAC3 O15379 1/20 0.41
BRAF P15056 1/20 0.41
HDAC4 P56524 1/20 0.41
HDAC1 Q13547 1/20 0.41
HDAC7 Q8WUI4 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21808151 0.85 MAPT (0.51) CCNE2CCNE1CDK2MAPTGAA
SCHEMBL27907622 0.81 MAPT (0.44) CCNE2CCNE1CDK2MAPTGAA
SCHEMBL28359611 0.81 MAPT (0.44) CCNE2CCNE1CDK2MAPTGAA
SCHEMBL7901398 0.80 MAPT (0.56) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL27737105 0.79 MAPT (0.61) CCNE2CCNE1CDK2MAPTGAA
SCHEMBL30170492 0.79 MAPT (0.45) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL26135851 0.78 POLB (0.45) CCNE2CCNE1CDK2MAPTGAA
SCHEMBL27637318 0.77 MAPT (0.53) MAPTGAAPOLBALDH1A1LMNA
SCHEMBL9859607 0.76 MAPT (0.61) CCNE2CCNE1CDK2MAPTGAA
SCHEMBL29363593 0.76 ADORA1 (0.44) MAPTGAAPOLBALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0929841-A4 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE QUANTUM COMPONENTS COLORAD (US) 2001-04-18 EP claimed
US-5955244-A Method for forming photoresist features having reentrant profiles using a basic agent QUANTUM CORPORATION (US) 1999-09-21 US claimed
EP-0929841-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT Mke-Quantum Components Colorado LLC (US) 1999-07-21 EP claimed
WO-1998008143-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE-QUANTUM COMPONENTS COLORADO LLC (US) 1998-02-26 WO claimed
WO-2008061258-A2 SELECTIVE METAL WET ETCH COMPOSITION AND PROCESS SACHEM, INC. (US) 2008-05-22 WO disclosed
US-20080116170-A1 SELECTIVE METAL WET ETCH COMPOSITION AND PROCESS SACHEM, INC. 2008-05-22 US disclosed
EP-0929841-A4 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE QUANTUM COMPONENTS COLORAD (US) 2001-04-18 EP disclosed
US-5955244-A Method for forming photoresist features having reentrant profiles using a basic agent QUANTUM CORPORATION (US) 1999-09-21 US disclosed
EP-0929841-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT Mke-Quantum Components Colorado LLC (US) 1999-07-21 EP disclosed
WO-1998008143-A1 METHOD FOR FORMING PHOTORESIST FEATURES HAVING REENTRANT PROFILES USING A BASIC AGENT MKE-QUANTUM COMPONENTS COLORADO LLC (US) 1998-02-26 WO disclosed