SCHEMBL4802987

SCHEMBL4802987

C=C(Cc1ccc(C2CCC(C(=O)OC)CC2)cc1)C(=O)O

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.45
HTT P42858 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
MAPT P10636 2/20 0.39
HPGD P15428 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
HSD17B10 Q99714 1/20 0.39
RAB9A P51151 2/20 0.38
NPC1 O15118 1/20 0.38
LMNA P02545 1/20 0.36
RORC P51449 1/20 0.36
CACNA1G O43497 1/20 0.35
CACNA1H O95180 1/20 0.35
CACNA1I Q9P0X4 1/20 0.35
HAO1 Q9UJM8 1/20 0.35
GAA P10253 1/20 0.35
KDM4C Q9H3R0 1/20 0.35
PDE4A P27815 1/20 0.35
PDE4B Q07343 1/20 0.35
PDE4C Q08493 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4809032 0.85 NPC1 (0.41) MAPTRAB9ANPC1RORCHAO1
SCHEMBL1088632 0.83 PANK3 (0.41) ALDH1A1MAPTRAB9ANPC1HAO1
SCHEMBL1089132 0.82 ESR2 (0.49) ALDH1A1SMN1; SMN2RAB9ANPC1RORC
SCHEMBL1088773 0.80 HAO1 (0.49) ALDH1A1HTTSMN1; SMN2RORCHAO1
SCHEMBL4801518 0.80 NPC1 (0.41) ALDH1A1SMN1; SMN2MAPTHPGDNPSR1
SCHEMBL4797944 0.79 PANK3 (0.38) ALDH1A1RAB9ANPC1RORCHAO1
SCHEMBL1089454 0.79 HAO1 (0.51) HTTSMN1; SMN2RAB9ANPC1RORC
SCHEMBL1088973 0.79 HAO1 (0.51) HTTSMN1; SMN2RAB9ANPC1RORC
SCHEMBL1089029 0.78 CYP19A1 (0.41) ALDH1A1MAPTLMNARORCHAO1
SCHEMBL181066 0.77 AKR1C3 (0.56) ALDH1A1SMN1; SMN2MAPTHPGDNPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7416821-B2 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2008-08-26 US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 WO disclosed