SCHEMBL4801518

SCHEMBL4801518

C=C(C(=O)O)c1ccc(C2CCC(C(=O)OC)CC2)cc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPC1 O15118 2/20 0.41
RAB9A P51151 2/20 0.41
HAO1 Q9UJM8 1/20 0.40
HDAC8 Q9BY41 2/20 0.39
HDAC6 Q9UBN7 2/20 0.39
HDAC1 Q13547 1/20 0.39
TSHR P16473 1/20 0.39
HDAC3 O15379 1/20 0.38
HDAC11 Q96DB2 1/20 0.38
ALDH1A1 P00352 3/20 0.38
MAPT P10636 2/20 0.38
LMNA P02545 1/20 0.38
PDE4A P27815 1/20 0.37
PDE4B Q07343 1/20 0.37
PDE4C Q08493 1/20 0.37
PDE4D Q08499 1/20 0.37
CYP2C9 P11712 1/20 0.37
HRH3 Q9Y5N1 1/20 0.36
AKR1C3 P42330 1/20 0.36
AKR1C1 Q04828 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4801277 0.84 NPC1 (0.44) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL8370055 0.82 ALDH1A1 (0.48) NPC1RAB9AHDAC8HDAC6HDAC1
SCHEMBL1088238 0.82 NPC1 (0.44) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL1088809 0.80 ESR2 (0.53) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL3540595 0.80 AKR1C3 (0.56) NPC1RAB9ATSHRALDH1A1MAPT
SCHEMBL181066 0.80 AKR1C3 (0.56) NPC1RAB9ATSHRALDH1A1MAPT
SCHEMBL4802987 0.80 ALDH1A1 (0.45) NPC1RAB9AHAO1ALDH1A1MAPT
SCHEMBL2255576 0.79 TSHR (0.43) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL2255570 0.79 TSHR (0.43) NPC1RAB9AHAO1HDAC8HDAC6
SCHEMBL28334528 0.79 ESR2 (0.52) NPC1RAB9AHAO1HDAC8HDAC6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7416821-B2 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2008-08-26 US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 WO disclosed