Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1997386 | 0.95 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL4824393 | 0.88 | — | — | |
| SCHEMBL4809036 | 0.84 | PTGS1 (0.31) | PTGS1PTGS2 | |
| SCHEMBL1405854 | 0.84 | — | — | |
| SCHEMBL4414035 | 0.82 | ALDH1A1 (0.31) | — | |
| SCHEMBL4807508 | 0.81 | — | — | |
| SCHEMBL5822582 | 0.80 | PTGS1 (0.32) | PTGS1PTGS2 | |
| SCHEMBL1993664 | 0.80 | PTGS1 (0.32) | PTGS1PTGS2 | |
| SCHEMBL384457 | 0.79 | PTGS1 (0.30) | PTGS1PTGS2 | |
| SCHEMBL5817818 | 0.79 | PTGS1 (0.32) | PTGS1PTGS2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2022264906-A1 | PRIMER COMPOSITION FOR INORGANIC OXIDE VAPOR DEPOSITION, CURED PRODUCT AND MULTILAYER BODY | DIC株式会社 | 2022-12-22 | — | — | WO | disclosed |
| EP-3213915-B1 | LAMINATE | DAINIPPON INK & CHEMICALS (JP) | 2019-08-14 | — | — | EP | disclosed |
| US-20170253965-A1 | LAMINATE | DIC CORPORATION (JP) | 2017-09-07 | — | — | US | disclosed |
| EP-3213915-A1 | LAMINATE | DIC Corporation (JP) | 2017-09-06 | — | — | EP | disclosed |
| US-20140061970-A1 | NANOIMPRINT CURABLE COMPOSITION, NANOIMPRINT-LITHOGRAPHIC MOLDED PRODUCT, AND METHOD FOR FORMING PATTERN | DIC CORPORATION (JP) | 2014-03-06 | — | — | US | disclosed |
| US-7435668-B2 | Method for doping impurities, and for producing a semiconductor device and applied electronic apparatus using a solution containing impurity ions | SONY CORPORATION (JP) | 2008-10-14 | — | — | US | disclosed |
| US-7335539-B2 | Method for making thin-film semiconductor device | SONY CORPORATION (JP) | 2008-02-26 | — | — | US | disclosed |
| US-20070298550-A1 | Method for making thin-film semiconductor device | SONY CORPORATION (JP) | 2007-12-27 | — | — | US | disclosed |
| US-7273774-B2 | Method for making thin-film semiconductor device | SONY CORPORATION (JP) | 2007-09-25 | — | — | US | disclosed |
| US-20060079033-A1 | Method for making thin-film semiconductor device | SONY CORPORATION (JP) | 2006-04-13 | — | — | US | disclosed |
| US-20050181566-A1 | Method for doping impurities, methods for producing semiconductor device and applied electronic apparatus | SONY CORPORATION (JP) | 2005-08-18 | — | — | US | disclosed |