SCHEMBL4808967

SCHEMBL4808967

C=C(Cc1ccc(-c2ccc(Cl)cc2)cc1)C(=O)O

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CTBP2 P56545 1/20 0.51
LMNA P02545 2/20 0.46
ABCC4 O15439 1/20 0.46
GAA P10253 1/20 0.46
TSHR P16473 1/20 0.46
PTGS1 P23219 1/20 0.46
HTT P42858 1/20 0.46
L3MBTL1 Q9Y468 3/20 0.44
MAPT P10636 2/20 0.44
PPARG P37231 4/20 0.44
PPARA Q07869 4/20 0.44
TDP1 Q9NUW8 1/20 0.44
NPC1 O15118 2/20 0.43
RAB9A P51151 2/20 0.43
ERCC5 P28715 1/20 0.43
FEN1 P39748 1/20 0.43
GFER P55789 1/20 0.42
ATM Q13315 1/20 0.42
ADAMTS5 Q9UNA0 1/20 0.42
PIK3CA P42336 2/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1629363 0.94 CTBP2 (0.56) CTBP2LMNAL3MBTL1MAPTPPARG
SCHEMBL2732935 0.90 LMNA (0.54) LMNAABCC4GAATSHRPTGS1
SCHEMBL36672 0.85 LMNA (0.64) LMNAABCC4GAATSHRPTGS1
SCHEMBL3426193 0.84 CA2 (0.46) CTBP2LMNAABCC4GAATSHR
Hydrochloric Acid SCHEMBL8692226 0.83 LMNA (0.62) LMNAABCC4GAATSHRPTGS1
SCHEMBL4806417 0.81 CTBP2 (0.51) CTBP2LMNAABCC4GAATSHR
SCHEMBL4805934 0.81 HAO1 (0.46) LMNAABCC4GAATSHRPTGS1
SCHEMBL4211639 0.80 ABCC4 (0.69) CTBP2LMNAABCC4GAATSHR
SCHEMBL4801218 0.79 MAPT (0.53) LMNAABCC4GAATSHRPTGS1
SCHEMBL22010460 0.78 CTBP2 (0.51) CTBP2LMNAABCC4GAATSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7416821-B2 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. (US) 2008-08-26 US disclosed
EP-1743363-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FujiFilm Electronic Materials USA, Inc. (US) 2007-01-17 EP disclosed
US-20050238997-A1 Thermally cured undercoat for lithographic application FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC. 2005-10-27 US disclosed
WO-2005089150-A2 THERMALLY CURED UNDERCOAT FOR LITHOGRAPHIC APPLICATION FUJIFILM ELECTRONIC MATERIALS USA INC. (US) 2005-09-29 WO disclosed