SCHEMBL4811799

SCHEMBL4811799

CCCC1=CCC(C)=C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6303309 1.00
SCHEMBL1539590 0.86 NPC1 (0.36)
SCHEMBL924997 0.86 NPC1 (0.36)
SCHEMBL6250217 0.85 PTGS2 (0.36)
SCHEMBL29010373 0.85 NPC1 (0.35)
SCHEMBL27988027 0.85 NPC1 (0.35)
SCHEMBL27988016 0.85 NPC1 (0.35)
SCHEMBL6253785 0.83 PTGS2 (0.38)
Hydrochloric Acid SCHEMBL3802951 0.83 NPC1 (0.34)
SCHEMBL6253058 0.83 PTGS2 (0.38)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 49 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119285661-A Method for synthesizing metal complex for advanced process 江苏先科半导体新材料有限公司 2025-01-10 CN claimed
WO-2013177269-A2 ZIRCONIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO claimed
WO-2013177284-A1 HAFNIUM-CONTAINING PRECURSORS FOR VAPOR DEPOSITION L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE (FR) 2013-11-28 WO claimed
EP-0648722-B1 Preparation of alkylcyclopentadienes ALBEMARLE CORP (US) 1997-05-07 EP claimed
US-5434324-A Preparation of alkylcyclopentadienes ALBEMARLE CORPORATION (US) 1995-07-18 US claimed
EP-0648722-A1 Preparation of alkylcyclopentadienes ALBEMARLE CORPORATION (US) 1995-04-19 EP claimed
JP-8231572-A None JP disclosed
US-20250109496-A1 FILM DEPOSITING COMPOSITION INCLUDING GROUP 4 METAL ELEMENT-CONTAINING PRECURSOR COMPOUND AND METHOD FOR FORMING FILM USING SAME UP CHEMICAL CO., LTD. (KR) 2025-04-03 US disclosed
CN-119710622-A Film deposition composition comprising group IV metal element-containing precursor compound and method of forming film using the same UP化学株式会社 2025-03-28 CN disclosed
EP-4524286-A1 FILM DEPOSITING COMPOSITION INCLUDING GROUP 4 METAL ELEMENT-CONTAINING PRECURSOR COMPOUND AND METHOD FOR FORMING FILM USING SAME Up Chemical Co., Ltd. (KR) 2025-03-19 EP disclosed
CN-117897518-B Film deposition composition comprising group IV metal element-containing precursor compound and method of forming film using the same UP化学株式会社 2025-01-21 CN disclosed
CN-119285661-A Method for synthesizing metal complex for advanced process 江苏先科半导体新材料有限公司 2025-01-10 CN disclosed
CN-118900855-A Polyolefin and film comprising polyolefin 株式会社LG化学 2024-11-05 CN disclosed
EP-0745616-A1 Catalyst composition and process for the production of olefinic polymers NIPPON OIL CO. LTD. (JP) 1996-12-04 EP disclosed
EP-0739872-A1 Process for converting exo-isomers of alkyl substituted cyclopentadienes to endo-isomers ALBEMARLE CORPORATION (US) 1996-10-30 EP disclosed
US-5569746-A Process for preparing alkylsubstituted cyclopentadienyl metallocene compounds ALBEMARLE CORPORATION (US) 1996-10-29 US disclosed
JP-H08231572-A PRODUCTION OF ALKYL-SUBSTITUTED CYCLOPENTADIENYLETALLOCENE COMPOUND ALBEMARLE CORP 1996-09-10 JP disclosed
EP-0727431-A2 Process for preparing alkylsubtituted cyclopentadienyl metallocene compounds ALBEMARLE CORPORATION (US) 1996-08-21 EP disclosed
US-5434324-A Preparation of alkylcyclopentadienes ALBEMARLE CORPORATION (US) 1995-07-18 US disclosed
EP-0648722-A1 Preparation of alkylcyclopentadienes ALBEMARLE CORPORATION (US) 1995-04-19 EP disclosed