⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5137465 | 0.88 | TSHR (0.31) | — | |
| SCHEMBL4100640 | 0.80 | — | — | |
| SCHEMBL4642632 | 0.78 | TSHR (0.34) | — | |
| SCHEMBL4320958 | 0.76 | — | — | |
| SCHEMBL4333990 | 0.76 | — | — | |
| SCHEMBL137442 | 0.76 | TSHR (0.31) | — | |
| SCHEMBL3813864 | 0.76 | TSHR (0.33) | — | |
| SCHEMBL4642583 | 0.76 | TSHR (0.33) | — | |
| SCHEMBL822781 | 0.75 | TSHR (0.30) | — | |
| SCHEMBL14510511 | 0.73 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7326512-B2 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2008-02-05 | — | — | US | disclosed |
| US-20050130056-A1 | Polymer compound, resist composition and dissolution inhibitor agent containing the polymer compound | UBS AG, STAMFORD BRANCH | 2005-06-16 | — | — | US | disclosed |