Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.50 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.49 |
| ▸ | EPHX2 | P34913 | 8/20 | 0.48 |
| ▸ | MEN1 | O00255 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | LMNA | P02545 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.47 |
| ▸ | PRKCA | P17252 | 1/20 | 0.46 |
| ▸ | TSHR | P16473 | 1/20 | 0.46 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.44 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14461586 | 0.90 | EPHX2 (0.49) | ALDH1A1NPSR1EPHX2MEN1KMT2A | |
| SCHEMBL482692 | 0.88 | ALDH1A1 (0.49) | ALDH1A1NPSR1EPHX2MEN1KMT2A | |
| SCHEMBL12132675 | 0.87 | ALDH1A1 (0.58) | ALDH1A1NPSR1MEN1KMT2ALMNA | |
| SCHEMBL13705972 | 0.84 | ALDH1A1 (0.53) | ALDH1A1NPSR1EPHX2MEN1KMT2A | |
| SCHEMBL7475995 | 0.84 | NPSR1 (0.53) | ALDH1A1NPSR1EPHX2MEN1KMT2A | |
| SCHEMBL1073543 | 0.83 | LMNA (0.59) | ALDH1A1NPSR1MEN1KMT2ALMNA | |
| SCHEMBL12972106 | 0.83 | PRKCA (0.50) | ALDH1A1NPSR1MEN1KMT2ALMNA | |
| SCHEMBL6707221 | 0.83 | ALDH1A1 (0.47) | ALDH1A1NPSR1MEN1KMT2ALMNA | |
| SCHEMBL5485543 | 0.81 | ALDH1A1 (0.46) | ALDH1A1NPSR1MEN1KMT2ALMNA | |
| SCHEMBL17471624 | 0.81 | ALDH1A1 (0.46) | ALDH1A1NPSR1MEN1KMT2ALMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 118 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | claimed |
| EP-2482132-B1 | Resist pattern forming process | SHINETSU CHEMICAL CO (JP) | 2019-10-16 | — | — | EP | disclosed |
| US-9946157-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20160291464-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-10-06 | — | — | US | disclosed |
| US-20150301452-A1 | PHOTORESIST COMPOSITION AND METHOD OF FABRICATING DISPLAY SUBSTRATE USING THE SAME | SAMSUNG DISPLAY CO., LTD. (KR) | 2015-10-22 | — | — | US | disclosed |
| EP-2244124-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-26 | — | — | EP | disclosed |
| US-9057949-B2 | Patterning process, resist composition, polymer, and polymerizable ester compound | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-06-16 | — | — | US | disclosed |
| EP-2239631-B1 | Patterning process | SHINETSU CHEMICAL CO (JP) | 2015-02-25 | — | — | EP | disclosed |
| EP-2244125-B1 | Resist composition | SHINETSU CHEMICAL CO (JP) | 2014-10-08 | — | — | EP | disclosed |
| EP-2146245-B1 | Resist composition and patterning process | SHINETSU CHEMICAL CO (JP) | 2014-06-25 | — | — | EP | disclosed |
| US-20020187421-A1 | Method of producing photoresist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-12-12 | — | — | US | disclosed |
| US-20020164540-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-11-07 | — | — | US | disclosed |
| US-20020155376-A1 | Mixture of radiation sensive compound and binder; fluoropolymers | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2002-10-24 | — | — | US | disclosed |
| US-20020081524-A1 | Chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-27 | — | — | US | disclosed |
| US-20020031718-A1 | Resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-03-14 | — | — | US | disclosed |
| US-20020012874-A1 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-31 | — | — | US | disclosed |
| US-20010016298-A1 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-23 | — | — | US | disclosed |
| EP-1122604-A2 | Chemically amplified positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-0856773-B1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL CO (JP) | 2001-06-13 | — | — | EP | disclosed |
| EP-0856773-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1998-08-05 | — | — | EP | disclosed |