Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | S100A4 | P26447 | 5/20 | 0.55 |
| ▸ | PTPRC | P08575 | 5/20 | 0.55 |
| ▸ | MEN1 | O00255 | 4/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.55 |
| ▸ | TDP2 | O95551 | 4/20 | 0.55 |
| ▸ | APAF1 | O14727 | 4/20 | 0.55 |
| ▸ | POLB | P06746 | 4/20 | 0.55 |
| ▸ | RAB9A | P51151 | 4/20 | 0.55 |
| ▸ | PLA2G1B | P04054 | 3/20 | 0.55 |
| ▸ | ATG4B | Q9Y4P1 | 3/20 | 0.55 |
| ▸ | LMNA | P02545 | 3/20 | 0.55 |
| ▸ | BLM | P54132 | 3/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 3/20 | 0.55 |
| ▸ | MAPT | P10636 | 3/20 | 0.55 |
| ▸ | MAOA | P21397 | 3/20 | 0.55 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.55 |
| ▸ | NPC1 | O15118 | 2/20 | 0.55 |
| ▸ | PLCG1 | P19174 | 2/20 | 0.55 |
| ▸ | PPARG | P37231 | 2/20 | 0.55 |
| ▸ | HTT | P42858 | 2/20 | 0.55 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8964577 | 0.94 | S100A4 (0.48) | S100A4PTPRCMEN1KMT2ATDP2 | |
| SCHEMBL8936666 | 0.88 | MEN1 (0.60) | S100A4PTPRCMEN1KMT2ATDP2 | |
| SCHEMBL29394495 | 0.82 | MEN1 (0.38) | S100A4PTPRCMEN1KMT2ATDP2 | |
| SCHEMBL482108 | 0.82 | MEN1 (0.38) | S100A4PTPRCMEN1KMT2ATDP2 | |
| SCHEMBL4962922 | 0.81 | CES1 (0.47) | S100A4PTPRCMEN1KMT2ATDP2 | |
| Anthraquinone SCHEMBL30003822 | 0.76 | MEN1 (0.75) | S100A4PTPRCMEN1KMT2ATDP2 | |
| Anthraquinone SCHEMBL2152357 | 0.76 | MEN1 (0.75) | S100A4PTPRCMEN1KMT2ATDP2 | |
| SCHEMBL8076780 | 0.76 | SMN1; SMN2 (0.37) | S100A4PTPRCMEN1KMT2ATDP2 | |
| SCHEMBL8076772 | 0.76 | SMN1; SMN2 (0.37) | S100A4PTPRCMEN1KMT2ATDP2 | |
| SCHEMBL8994826 | 0.75 | SMN1; SMN2 (0.33) | S100A4PTPRCMEN1KMT2ATDP2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5049477-A | Image forming, etching, plating | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-17 | — | — | US | claimed |
| US-4324852-A | REDOX COUPLES | EASTMAN KODAK COMPANY (US) | 1982-04-13 | — | — | US | claimed |
| US-4243737-A | NONSILVER PHOTOGRAPHIC FILM | EASTMAN KODAK COMPANY (US) | 1981-01-06 | — | — | US | claimed |
| US-4201588-A | NONSILVER PHOTOGRAPHIC FILMS; DISULFIDE, DIAZOANTHRONE, DIAZOPHENANTHRONE, AROMATIC AZIDE, CARBAZIDES OR QUINONES AS PHOTOREDUCTANT; EXTERNAL HYDROGEN SOURCE | EASTMAN KODAK COMPANY (US) | 1980-05-06 | — | — | US | claimed |
| US-4195998-A | NONSILVER PHOTOGRAPHIC FILMS; DISULFIDE, DIAZOANTHRONE, DIAZOPHENANTHRONE, AROMATIC AZIDE, QUINONE OR CARBAZIDE PHOTOREDUCTANT | EASTMAN KODAK COMPANY (US) | 1980-04-01 | — | — | US | claimed |
| US-4057427-A | PHOTOGRAPHY | EASTMAN KODAK COMPANY (US) | 1977-11-08 | — | — | US | claimed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| EP-1117003-B1 | Process of preparing a chemical amplification type resist composition | SHINETSU CHEMICAL CO (JP) | 2012-06-20 | — | — | EP | disclosed |
| US-8173354-B2 | Sulfonium salt, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-05-08 | — | — | US | disclosed |
| US-8114571-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-8114570-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-02-14 | — | — | US | disclosed |
| US-4188217-A | NONSILVER PHOTOGRAPHY | EASTMAN KODAK COMPANY (US) | 1980-02-12 | — | — | US | disclosed |
| US-4171221-A | NONSILVER PHOTOGTAPHY | EASTMAN KODAK COMPANY (US) | 1979-10-16 | — | — | US | disclosed |
| US-4124392-A | LEUCO DYES | EASTMAN KODAK COMPANY (US) | 1978-11-07 | — | — | US | disclosed |
| US-4075019-A | RADIATION-SENSITIVE ELEMENT, CHELATING AGENT | EASTMAN KODAK COMPANY (US) | 1978-02-21 | — | — | US | disclosed |
| US-4061497-A | COBALTOUS SULFIDE, COLOR COUPLER, REDOX | EASTMAN KODAK COMPANY (US) | 1977-12-06 | — | — | US | disclosed |
| US-4057427-A | PHOTOGRAPHY | EASTMAN KODAK COMPANY (US) | 1977-11-08 | — | — | US | disclosed |
| US-4045221-A | Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex | EASTMAN KODAK COMPANY (US) | 1977-08-30 | — | — | US | disclosed |