Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.47 |
| ▸ | HPGD | P15428 | 6/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.47 |
| ▸ | MEN1 | O00255 | 3/20 | 0.47 |
| ▸ | GLA | P06280 | 2/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.47 |
| ▸ | L3MBTL1 | Q9Y468 | 3/20 | 0.46 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | MAPT | P10636 | 1/20 | 0.41 |
| ▸ | ATM | Q13315 | 1/20 | 0.41 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.38 |
| ▸ | CDC25B | P30305 | 3/20 | 0.37 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.37 |
| ▸ | PPARG | P37231 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL482475 | 0.83 | ALDH1A1 (0.53) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL13327344 | 0.81 | KDM4E (0.50) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL13327346 | 0.78 | CDC25B (0.52) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL13327342 | 0.77 | TSHR (0.40) | ALDH1A1KDM4EHSD17B10CYP1A2CYP2C19 | |
| SCHEMBL5835576 | 0.77 | CA12 (0.55) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL13159644 | 0.76 | ALDH1A1 (0.43) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL21939652 | 0.76 | ALDH1A1 (0.52) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL9908975 | 0.75 | ALDH1A1 (0.52) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL1164214 | 0.75 | KDM4E (0.55) | ALDH1A1KDM4EHPGDKMT2AMEN1 | |
| SCHEMBL12689824 | 0.75 | MEN1 (0.39) | ALDH1A1KDM4EHPGDKMT2AMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 99 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-10120628-A | — | — | None | — | — | JP | disclosed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2507669-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2015-01-07 | — | — | EP | disclosed |
| US-8741542-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8741542-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, film formed using the composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2014-06-03 | — | — | US | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-20120244472-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| US-20120244472-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, FILM FORMED USING THE COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2012-09-27 | — | — | US | disclosed |
| EP-1117003-B1 | Process of preparing a chemical amplification type resist composition | SHINETSU CHEMICAL CO (JP) | 2012-06-20 | — | — | EP | disclosed |
| EP-1039346-A1 | Resist compositions and pattering process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-27 | — | — | EP | disclosed |
| US-6117621-A | APPLYING A CHEMICALLY AMPLIFIED POSITIVE RESIST OF A POLYMER WITH ACID LABILE GROUPS, A PHOTOACID GENERATOR AND A ORGANIC SOLVENT; RESOLUTION AND FOCAL DEPTH; EXPOSING, BAKING, AND DEVELOPING; CALIBRATION OF EXPOSURES AND DISSOLUTION RATES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-12 | — | — | US | disclosed |
| US-6114462-A | CROSSLINKING A POLYVINYLPHENOL DERIVATIVE WITH UNSATURATED ETHER DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-09-05 | — | — | US | disclosed |
| US-6048661-A | POLYMER WITH HYDROXY AND CARBOXY GROUPS AND ETHER ESTER GROUPS FOR PHOTORESISTS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-04-11 | — | — | US | disclosed |
| US-6033828-A | POLYVINYLPHENOL DERIVATIVES | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2000-03-07 | — | — | US | disclosed |
| US-6027854-A | ACTINIC RADIATION-SENSITIVE, CROSSLINKED TERPOLYMER CONTAINING STYRENIC GROUPS RING-SUBSTITUTED WITH HYDROXYL, HYDROXYALKYLOXY, CARBOXYALKYLOXY MOIETIES AND ACID LABILE GROUPS; ETCHING AND HEAT RESISTANCE | SHIN-ETSU CHEMICAL CO., LTD. | 2000-02-22 | — | — | US | disclosed |
| US-5942367-A | HIGH SENSITIVITY, RESOLUTION | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-08-24 | — | — | US | disclosed |
| EP-0908783-A1 | Resist compositions, their preparation and use for patterning processes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| EP-0908473-A1 | Styrene polymers, chemically-amplified positive resist compositions, their preparation and use in a patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 1999-04-14 | — | — | EP | disclosed |
| JP-H10120628-A | CARBOXYLIC ACID DERIVATIVE HAVING TRICYCLIC AROMATIC SKELETON | SHIN ETSU CHEM CO LTD | 1998-05-12 | — | — | JP | disclosed |