Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.52 |
| ▸ | CA1 | P00915 | 3/20 | 0.46 |
| ▸ | CA2 | P00918 | 3/20 | 0.46 |
| ▸ | CA12 | O43570 | 2/20 | 0.46 |
| ▸ | CA7 | P43166 | 2/20 | 0.46 |
| ▸ | CA9 | Q16790 | 2/20 | 0.46 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.46 |
| ▸ | TYR | P14679 | 1/20 | 0.46 |
| ▸ | MIF | P14174 | 2/20 | 0.42 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.42 |
| ▸ | MMP2 | P08253 | 1/20 | 0.41 |
| ▸ | MMP9 | P14780 | 1/20 | 0.41 |
| ▸ | MMP13 | P45452 | 1/20 | 0.41 |
| ▸ | TAS1R3 | Q7RTX0 | 2/20 | 0.39 |
| ▸ | TAS1R1 | Q7RTX1 | 2/20 | 0.39 |
| ▸ | ABCG2 | Q9UNQ0 | 1/20 | 0.39 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.39 |
| ▸ | MAPT | P10636 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 1/20 | 0.38 |
| ▸ | AKR1B10 | O60218 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| 4-Vinylphenol SCHEMBL4396988 | 0.94 | ALDH1A1 (0.46) | ALDH1A1CA1CA2CA12CA7 | |
| SCHEMBL7644030 | 0.93 | ALDH1A1 (0.60) | ALDH1A1TAS1R3TAS1R1TRPA1MAPT | |
| Hydroquinone SCHEMBL4753503 | 0.87 | ALDH1A1 (0.68) | ALDH1A1CA1CA2CA12CA7 | |
| SCHEMBL28804590 | 0.86 | ALDH1A1 (0.52) | ALDH1A1KDM4ETAS1R3TAS1R1MAPT | |
| SCHEMBL29047981 | 0.85 | ALDH1A1 (0.50) | ALDH1A1TAS1R3TAS1R1MAPTMAOB | |
| SCHEMBL28266552 | 0.85 | ALDH1A1 (0.50) | ALDH1A1MAPTPOLBTHRB | |
| SCHEMBL29047980 | 0.85 | ALDH1A1 (0.50) | ALDH1A1TAS1R3TAS1R1MAPTPOLB | |
| Styrene SCHEMBL8576362 | 0.84 | ALDH1A1 (0.54) | ALDH1A1KDM4EMAPTPOLB | |
| Styrene SCHEMBL35776 | 0.84 | ALDH1A1 (0.54) | ALDH1A1KDM4EMAPTPOLB | |
| Styrene SCHEMBL678464 | 0.84 | ALDH1A1 (0.54) | ALDH1A1KDM4EMAPTPOLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5919601-A | COMPRISING THERMAL-ACTIVATED ACID GENERATOR, CROSSLINKING RESIN, BINDER RESIN CONTAINING PENDANT GROUPS CAPABLE OF UNDERGOING ACID-CATALYZED CONDENSATION WITH CROSSLINKING RESIN, INFRARED ABSORBER | KODAK POLYCHROME GRAPHICS, LLC (US) | 1999-07-06 | — | — | US | claimed |
| CN-118502197-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2024-08-16 | — | — | CN | disclosed |
| CN-117352374-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2024-01-05 | — | — | CN | disclosed |
| CN-114195142-B | Graphene transfer method for stripping polymer support material based on alcohol solvent | 香港城市大学深圳研究院 | 2023-05-26 | — | — | CN | disclosed |
| CN-116057739-A | Membrane seal assembly | 庄信万丰氢能科技有限公司 | 2023-05-02 | — | — | CN | disclosed |
| WO-2023049003-A1 | SYSTEMS, METHODS, AND MEDIA FOR PREDICTING PRESENCE OF ONE OR MORE MOLECULES USING CHEMICAL SENSORS | NUTECH VENTURES (US) | 2023-03-30 | — | — | WO | disclosed |
| CN-115524926-A | Method for manufacturing semiconductor device | 台湾积体电路制造股份有限公司 | 2022-12-27 | — | — | CN | disclosed |
| CN-114195142-A | Graphene transfer method based on stripping of polymer support material by alcohol solvent | 香港城市大学深圳研究院 | 2022-03-18 | — | — | CN | disclosed |
| US-10633486-B2 | Polymer resin compound and photosensitive resin composition for black bank comprising same | LG CHEM, LTD. (KR) | 2020-04-28 | — | — | US | disclosed |
| US-20190241701-A1 | POLYMER RESIN COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION FOR BLACK BANK COMPRISING SAME | LG CHEM, LTD. (KR) | 2019-08-08 | — | — | US | disclosed |
| US-5350660-A | Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1994-09-27 | — | — | US | disclosed |
| EP-0319016-B1 | Treatment and after-treatment of metal with polyphenol compounds | HENKEL CORP (US) | 1994-06-22 | — | — | EP | disclosed |
| US-5298289-A | Amine derivatives of polyvinylphenol for improved corrosion resistance of metals and rinsability of plastics | HENKEL CORPORATION (US) | 1994-03-29 | — | — | US | disclosed |
| US-5266410-A | Treatment and after-treatment of metal with polyphenol compounds | HENKEL CORPORATION (US) | 1993-11-30 | — | — | US | disclosed |
| US-5124234-A | Protective coating for printed circuits | FUJI PHOTO FILM CO., LTD. (JP) | 1992-06-23 | — | — | US | disclosed |
| US-5116912-A | Protective or decorative surface treatment of metal or plastic articles | HENKEL CORPORATION (US) | 1992-05-26 | — | — | US | disclosed |
| CN-1057847-A | The lower optical densities polymkeric substance that photoresist material and optical application are used and the preparation method of multipolymer | HOECHST CELANESE CORP (US) | 1992-01-15 | — | — | CN | disclosed |
| US-5039770-A | Treatment and after-treatment of metal with polyphenol compounds | HENKEL CORPORATION (US) | 1991-08-13 | — | — | US | disclosed |
| EP-0440374-A2 | Chemical amplified resist material | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1991-08-07 | — | — | EP | disclosed |
| EP-0319016-A2 | Treatment and after-treatment of metal with polyphenol compounds | HENKEL CORPORATION (a Delaware corp.) (US) | 1989-06-07 | — | — | EP | disclosed |