Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 6/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA7 | P43166 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | LPL | P06858 | 1/20 | 0.35 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.35 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.35 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.35 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.35 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12762110 | 0.97 | ACHE (0.57) | ACHETDP1ALDH1A1CA2CA1 | |
| SCHEMBL37146 | 0.97 | ACHE (0.57) | ACHETDP1ALDH1A1CA2CA1 | |
| Iodide SCHEMBL8433250 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Water SCHEMBL1765019 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Hydrogen Sulfide SCHEMBL29644447 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Bromide SCHEMBL4916423 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Fluoride Ion SCHEMBL2230337 | 0.90 | ACHE (0.50) | ACHETDP1ALDH1A1CA2CA1 | |
| Hydrochloric Acid SCHEMBL5709632 | 0.89 | ACHE (0.50) | ACHETDP1ALDH1A1CA2CA1 | |
| SCHEMBL2283745 | 0.85 | ACHE (0.44) | ACHETDP1ALDH1A1CA2CA1 | |
| SCHEMBL425893 | 0.85 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 103 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4912171-A | Blend of addition polymer, polyhydroxy compound, organo-onium compound and acid acceptor | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1990-03-27 | — | — | US | claimed |
| US-4882390-A | AND POLYHYDROXY COMPOUND | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-11-21 | — | — | US | claimed |
| EP-2105794-B1 | Novel photoacid generator, resist composition, and patterning process | SHINETSU CHEMICAL CO (JP) | 2015-08-19 | — | — | EP | disclosed |
| EP-2033966-B1 | Novel photoacid generators, resist compositons, and patterning processes | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| EP-2256551-B1 | Pattern forming process using a chemically amplified resist composition | SHINETSU CHEMICAL CO (JP) | 2015-05-13 | — | — | EP | disclosed |
| EP-1682609-B1 | METHOD OF MODIFYING A FLUOROPOLYMER AND ARTICLES THEREBY | 3M INNOVATIVE PROPERTIES CO (US) | 2015-03-11 | — | — | EP | disclosed |
| US-8609889-B2 | Photoacid generator, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-12-17 | — | — | US | disclosed |
| EP-1710230-B1 | Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process | SHINETSU CHEMICAL CO (JP) | 2013-08-14 | — | — | EP | disclosed |
| US-8394570-B2 | Sulfonium salt, acid generator, resist composition, photomask blank, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-03-12 | — | — | US | disclosed |
| US-8288076-B2 | Chemically amplified resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-16 | — | — | US | disclosed |
| US-8283104-B2 | Sulfonate and its derivative, photosensitive acid generator, and resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2012-10-09 | — | — | US | disclosed |
| US-6303706-B1 | Resin composition for powder coating | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-1077391-A1 | Onium salts, photoacid generators for resist compositions, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2001-02-21 | — | — | EP | disclosed |
| EP-1057875-A1 | RESIN COMPOSITIONS FOR POWDERY COATINGS | Nissan Chemical Industries, Ltd. (JP) | 2000-12-06 | — | — | EP | disclosed |
| US-6114473-A | COMPRISING CARBOXYL GROUP-CONTAINING RESIN HAVING MOLECULAR WEIGHT OF 1,000 TO 20,000, ACID VALUE OF 5 TO 200, GLASS TRANSITION TEMPERATURE OF 30 TO 120 DEGREES C, POLYMERIZATION INHIBITOR, TRIS(BETA-METHYLGLYCIDYL)ISOCYANURATE | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2000-09-05 | — | — | US | disclosed |
| US-6084035-A | BIS(BETA-METHYLGLYCIDYL)TEREPHTHALATE CURING AGENT, CARBOXYL GROUP-CONTAINING RESIN, AND A RING-OPENING POLYMERIZATION INHIBITOR SELECTED FROM A COMPOUND HAVING AN AMIDINE LINKAGE, TRIARYLPHOSPHINES, AND ONIUM SALTS | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2000-07-04 | — | — | US | disclosed |
| EP-0906941-A1 | WEATHER-RESISTANT RESIN COMPOSITION FOR POWDER COATING | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 1999-04-07 | — | — | EP | disclosed |
| EP-0794984-A1 | RESIN COMPOSITION FOR POWDER COATING | NISSAN CHEMICAL INDUSTRIES, LIMITED (JP) | 1997-09-17 | — | — | EP | disclosed |
| WO-1996017026-A1 | RESIN COMPOSITION FOR POWDER COATING | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 1996-06-06 | — | — | WO | disclosed |
| EP-0335705-A1 | Fluoroelastomer composition | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1989-10-04 | — | — | EP | disclosed |