Known targets — ChEMBL curated mechanism
GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQ
The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 6/20 | 0.53 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.40 |
| ▸ | CA2 | P00918 | 2/20 | 0.40 |
| ▸ | CA1 | P00915 | 1/20 | 0.40 |
| ▸ | CA7 | P43166 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | LMNA | P02545 | 2/20 | 0.37 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.37 |
| ▸ | CYP2A6 | P11509 | 2/20 | 0.35 |
| ▸ | IDO1 | P14902 | 1/20 | 0.35 |
| ▸ | CES2 | O00748 | 1/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.35 |
| ▸ | LPL | P06858 | 1/20 | 0.35 |
| ▸ | LIPG | Q9Y5X9 | 1/20 | 0.35 |
| ▸ | ORAI1 | Q96D31 | 1/20 | 0.35 |
| ▸ | ORAI2 | Q96SN7 | 1/20 | 0.35 |
| ▸ | ORAI3 | Q9BRQ5 | 1/20 | 0.35 |
| ▸ | TRPV6 | Q9H1D0 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL37146 | 0.97 | ACHE (0.57) | ACHETDP1ALDH1A1CA2CA1 | |
| SCHEMBL12762110 | 0.97 | ACHE (0.57) | ACHETDP1ALDH1A1CA2CA1 | |
| Hydrochloric Acid SCHEMBL482494 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Hydrogen Sulfide SCHEMBL29644447 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Iodide SCHEMBL8433250 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Bromide SCHEMBL4916423 | 0.93 | ACHE (0.53) | ACHETDP1ALDH1A1CA2CA1 | |
| Fluoride Ion SCHEMBL2230337 | 0.90 | ACHE (0.50) | ACHETDP1ALDH1A1CA2CA1 | |
| SCHEMBL7159722 | 0.85 | ACHE (0.44) | ACHETDP1ALDH1A1CA2CA1 | |
| SCHEMBL30990105 | 0.85 | ACHE (0.44) | ACHETDP1ALDH1A1CA2CA1 | |
| SCHEMBL2283745 | 0.85 | ACHE (0.44) | ACHETDP1ALDH1A1CA2CA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110122177-A1 | Ink Jet Recording Apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-05-26 | — | — | US | disclosed |
| US-7896484-B2 | Ink jet recording apparatus | KABUSHIKI KAISHA TOSHIBA (JP) | 2011-03-01 | — | — | US | disclosed |
| US-7834113-B2 | Photoresist compositions and processes for preparing the same | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 2010-11-16 | — | — | US | disclosed |
| US-7754785-B2 | Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2010-07-13 | — | — | US | disclosed |
| US-20100105785-A1 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | SHEEHAN MICHAEL T | 2010-04-29 | — | — | US | disclosed |
| US-7662538-B2 | Derivatized polyhydroxystyrenes (DPHS) with a novolak type structure and blocked DPHS (BDPHS) and processes for preparing the same | Du Pont Electronic Polymers L.P. (US) | 2010-02-16 | — | — | US | disclosed |
| US-7579390-B2 | Inkjet ink composition and printed matters created using inkjet ink composition | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-08-25 | — | — | US | disclosed |
| US-7473720-B2 | Photosensitive inkjet ink | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2009-01-06 | — | — | US | disclosed |
| US-20080273066-A1 | Ink jet recording apparatus | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-11-06 | — | — | US | disclosed |
| US-7439281-B2 | Pigment dispersion, precursor of ink for UV-curing type ink-jet recording, method of ink-jet recording, printed matter, and method of manufacturing pigment dispersion | TOSHIBA TEC KABUSHIKI KAISHA (JP) | 2008-10-21 | — | — | US | disclosed |
| EP-0827970-B1 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT FINANCE BVI LTD (VG) | 2001-09-26 | — | — | EP | disclosed |
| US-6284427-B1 | Process for preparing resists | CLARIANT FINANCE (BVI) LIMITED (VG) | 2001-09-04 | — | — | US | disclosed |
| EP-0611998-B1 | Positive-working radiation-sensitive mixture | CLARIANT FINANCE BVI LTD (VG) | 2000-08-02 | — | — | EP | disclosed |
| EP-0989459-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION | Clariant Finance (BVI) Limited (VG) | 2000-03-29 | — | — | EP | disclosed |
| EP-0942329-A1 | NOVEL PROCESS FOR PREPARING RESISTS | Clariant International Ltd. (CH) | 1999-09-15 | — | — | EP | disclosed |
| US-5852128-A | Acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | CLARIANT AG (CH) | 1998-12-22 | — | — | US | disclosed |
| US-5843319-A | Positive-working radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1998-12-01 | — | — | US | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| US-5525453-A | MIXTURE OF POLYMERIC BINDER, COMPOUND HAVING ATLEAST ONE CLEAVABLE WITH AN ACID, A COMPOUND CAPABLE OF PRODUCING AN ACID UPON RADIATION, A BASIC AMMONIUM AND A BASIC SULFONIUM COMPOUND | HOECHST JAPAN LIMITED (JP) | 1996-06-11 | — | — | US | disclosed |
| EP-0611998-A2 | Positive-working radiation-sensitive mixture | HOECHST JAPAN LIMITED (JP) | 1994-08-24 | — | — | EP | disclosed |