⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL482920 | 0.92 | — | — | |
| SCHEMBL483215 | 0.87 | RIPK1 (0.33) | — | |
| SCHEMBL483195 | 0.86 | RIPK1 (0.31) | — | |
| SCHEMBL482515 | 0.85 | PPARG (0.31) | — | |
| SCHEMBL482971 | 0.84 | ALDH1A1 (0.32) | — | |
| SCHEMBL30661211 | 0.81 | RIPK1 (0.31) | — | |
| SCHEMBL482924 | 0.81 | RIPK1 (0.35) | — | |
| SCHEMBL482535 | 0.80 | RIPK1 (0.38) | — | |
| SCHEMBL483092 | 0.80 | RIPK1 (0.31) | — | |
| SCHEMBL482671 | 0.79 | RIPK1 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113168093-B | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-113383273-B | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2023-11-14 | — | — | CN | disclosed |
| EP-0949540-B1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJIFILM CORP (JP) | 2012-05-02 | — | — | EP | disclosed |
| EP-1249731-B1 | Photosensitive composition and negative working lithographic printing plate | FUJIFILM CORP (JP) | 2012-04-25 | — | — | EP | disclosed |
| EP-1288720-B1 | Plate-making method of printing plate | FUJIFILM CORP (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-1744212-B1 | Photosensitive composition | FUJIFILM CORP (JP) | 2012-01-11 | — | — | EP | disclosed |
| EP-1834765-A2 | Lithographic printing plate precursor and method for preparation of lithographic printing plate | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-20070212641-A1 | Lithographic printing plate precursor and method for preparation of lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
| EP-1728838-B1 | Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same | FUJIFILM CORP (JP) | 2007-08-15 | — | — | EP | disclosed |
| EP-1728838-A1 | Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same | Fuji Photo Film Co., Ltd. (JP) | 2006-12-06 | — | — | EP | disclosed |
| US-20030091933-A1 | Photosensitive composition and negative working lithographic printing plate | FUJIFILM CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030084806-A1 | FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES | FUJIFILM CORPORATION (JP) | 2003-05-08 | — | — | US | disclosed |
| EP-1288720-A1 | Plate-making method of printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-05 | — | — | EP | disclosed |
| US-6476092-B1 | Photopolymerizable composition containing a polymerizable acrylic compound with hetero-substituted methyl or halo-substituted methyl at the alpha position | FUJI PHOTO FILM CO., LTD. (JP) | 2002-11-05 | — | — | US | disclosed |
| EP-1249731-A2 | Photosensitive composition and negative working lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-16 | — | — | EP | disclosed |
| EP-1238801-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1091247-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-6153660-A | VERY HIGH SENSITIVITY TO BEAMS IN THE VISIBLE REGION, PARTICULARLY TO VISIBLE RAYS AT 400 NM OR MORE SUCH AS RAYS AT 488 NM OR 532 NM CORRESPONDING TO THE OUTPUT OF AR+ LASER OR YAG-SHG LASER | FUJI PHOTO FILM CO., LTD. (JP) | 2000-11-28 | — | — | US | disclosed |
| EP-0949540-A1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJI PHOTO FILM CO., LTD (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0924570-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-06-23 | — | — | EP | disclosed |