Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 6/20 | 0.78 |
| ▸ | CDC25B | P30305 | 5/20 | 0.78 |
| ▸ | MAOA | P21397 | 4/20 | 0.78 |
| ▸ | MAOB | P27338 | 3/20 | 0.78 |
| ▸ | PIN1 | Q13526 | 2/20 | 0.78 |
| ▸ | EHMT2 | Q96KQ7 | 2/20 | 0.78 |
| ▸ | SNCA | P37840 | 2/20 | 0.78 |
| ▸ | AKT1 | P31749 | 1/20 | 0.78 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.78 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.78 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.78 |
| ▸ | MEN1 | O00255 | 7/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 7/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.46 |
| ▸ | MAPT | P10636 | 5/20 | 0.46 |
| ▸ | HPGD | P15428 | 5/20 | 0.46 |
| ▸ | RECQL | P46063 | 4/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.46 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.46 |
| ▸ | LMNA | P02545 | 4/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthoquinone SCHEMBL29837141 | 1.00 | IDO1 (0.78) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL29458764 | 1.00 | IDO1 (0.78) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL11132565 | 0.93 | CDC25B (0.67) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL60195 | 0.93 | CDC25B (0.67) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL6010449 | 0.93 | CDC25B (0.67) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL9704148 | 0.93 | CDC25B (0.67) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL482597 | 0.90 | IDO1 (0.70) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL29354680 | 0.88 | IDO1 (1.00) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL11359780 | 0.88 | IDO1 (1.00) | IDO1CDC25BMAOAMAOBPIN1 | |
| Naphthoquinone SCHEMBL42139 | 0.88 | IDO1 (1.00) | IDO1CDC25BMAOAMAOBPIN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 159 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024082896-A1 | ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE CURED FILM | 上海八亿时空先进材料有限公司 | 2024-04-25 | — | — | WO | claimed |
| CN-117142986-A | Diazonaphthoquinone compound and preparation process thereof, photoresist and preparation process thereof | 福建省德尚电子材料有限公司 | 2023-12-01 | — | — | CN | claimed |
| CN-116492989-B | Supported active carbon, preparation method and application thereof in purification of electronic photosensitive compound | 湖南先伟实业有限公司 | 2023-09-08 | — | — | CN | claimed |
| CN-116492989-A | Supported active carbon, preparation method and application thereof in purification of electronic photosensitive compound | 湖南先伟实业有限公司 | 2023-07-28 | — | — | CN | claimed |
| US-5831703-A | Photosensitive film having birefringence and liquid crystal display device using the same and method for producing the photosensitive film and the liquid crystal display device | SHARP KABUSHIKI KAISHA (JP) | 1998-11-03 | — | — | US | claimed |
| JP-4320849-A | — | — | None | — | — | JP | disclosed |
| JP-4320850-A | — | — | None | — | — | JP | disclosed |
| JP-7013329-A | — | — | None | — | — | JP | disclosed |
| JP-56076530-A | — | — | None | — | — | JP | disclosed |
| JP-56147146-A | — | — | None | — | — | JP | disclosed |
| JP-6283864-A | — | — | None | — | — | JP | disclosed |
| JP-1088447-A | — | — | None | — | — | JP | disclosed |
| JP-H04320850-A | MANUFACTURE OF SUBSTRATE FOR RECORDING HEAD AND RECORDING HEAD | CANON INC | 1992-11-11 | — | — | JP | disclosed |
| JP-H04320849-A | MANUFACTURE OF SUBSTRATE FOR RECORDING HEAD AND RECORDING HEAD | CANON INC | 1992-11-11 | — | — | JP | disclosed |
| US-5106932-A | Polymers usable as positive photoresists | CIBA-GEIGY CORPORATION (US) | 1992-04-21 | — | — | US | disclosed |
| EP-0478321-A1 | Photosenstive resin composition for forming polyimide film pattern and method of forming polyimide film pattern | KABUSHIKI KAISHA TOSHIBA (JP) | 1992-04-01 | — | — | EP | disclosed |
| JP-S6488447-A | PHOTOSENSITIVE COMPOSITION | TOSHIBA CORP | 1989-04-03 | — | — | JP | disclosed |
| JP-S56147146-A | PHOTOETCHING METHOD | FUJITSU LTD | 1981-11-14 | — | — | JP | disclosed |
| JP-S5676530-A | EXPOSURE OF RESIST | FUJITSU LTD | 1981-06-24 | — | — | JP | disclosed |
| JP-S06488447-A | — | — | 0001-01-01 | — | — | JP | disclosed |