Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | IDO1 | P14902 | 6/20 | 0.70 |
| ▸ | CDC25B | P30305 | 5/20 | 0.70 |
| ▸ | MAOA | P21397 | 3/20 | 0.70 |
| ▸ | PIN1 | Q13526 | 2/20 | 0.70 |
| ▸ | EHMT2 | Q96KQ7 | 2/20 | 0.70 |
| ▸ | MAOB | P27338 | 2/20 | 0.70 |
| ▸ | SNCA | P37840 | 2/20 | 0.70 |
| ▸ | AKT1 | P31749 | 1/20 | 0.70 |
| ▸ | MAP2K1 | Q02750 | 1/20 | 0.70 |
| ▸ | NSD1 | Q96L73 | 1/20 | 0.70 |
| ▸ | EHMT1 | Q9H9B1 | 1/20 | 0.70 |
| ▸ | MEN1 | O00255 | 8/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 7/20 | 0.43 |
| ▸ | MAPT | P10636 | 6/20 | 0.43 |
| ▸ | HPGD | P15428 | 5/20 | 0.43 |
| ▸ | RECQL | P46063 | 4/20 | 0.43 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.43 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.43 |
| ▸ | LMNA | P02545 | 4/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthoquinone SCHEMBL6010449 | 0.98 | CDC25B (0.67) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL11132565 | 0.98 | CDC25B (0.67) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL60195 | 0.98 | CDC25B (0.67) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL9704148 | 0.98 | CDC25B (0.67) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL7526925 | 0.91 | CDC25B (0.58) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL23630677 | 0.90 | IDO1 (0.78) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL29458764 | 0.90 | IDO1 (0.78) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL29837141 | 0.90 | IDO1 (0.78) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL21809016 | 0.90 | IDO1 (0.78) | IDO1CDC25BMAOAPIN1EHMT2 | |
| Naphthoquinone SCHEMBL482594 | 0.90 | IDO1 (0.78) | IDO1CDC25BMAOAPIN1EHMT2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 205 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024082896-A1 | ALKALI-SOLUBLE RESIN, PHOTOSENSITIVE RESIN COMPOSITION, AND PHOTOSENSITIVE CURED FILM | 上海八亿时空先进材料有限公司 | 2024-04-25 | — | — | WO | claimed |
| CN-117142986-A | Diazonaphthoquinone compound and preparation process thereof, photoresist and preparation process thereof | 福建省德尚电子材料有限公司 | 2023-12-01 | — | — | CN | claimed |
| CN-116492989-B | Supported active carbon, preparation method and application thereof in purification of electronic photosensitive compound | 湖南先伟实业有限公司 | 2023-09-08 | — | — | CN | claimed |
| CN-116492989-A | Supported active carbon, preparation method and application thereof in purification of electronic photosensitive compound | 湖南先伟实业有限公司 | 2023-07-28 | — | — | CN | claimed |
| CN-1310295-C | Material for forming fine pattern and method for manufacturing semiconductor device using the same | MITSUBISHI ELECTRIC CORP (JP) | 2007-04-11 | — | — | CN | claimed |
| CN-1199922-A | Material for forming fine pattern and method for manufacturing semiconductor device using the same | MITSUBISHI ELECTRIC CORP (JP) | 1998-11-25 | — | — | CN | claimed |
| US-5831703-A | Photosensitive film having birefringence and liquid crystal display device using the same and method for producing the photosensitive film and the liquid crystal display device | SHARP KABUSHIKI KAISHA (JP) | 1998-11-03 | — | — | US | claimed |
| JP-56076530-A | — | — | None | — | — | JP | disclosed |
| JP-5197143-A | — | — | None | — | — | JP | disclosed |
| JP-62054917-A | — | — | None | — | — | JP | disclosed |
| JP-8301990-A | — | — | None | — | — | JP | disclosed |
| JP-6283864-A | — | — | None | — | — | JP | disclosed |
| JP-1088447-A | — | — | None | — | — | JP | disclosed |
| JP-S6488447-A | PHOTOSENSITIVE COMPOSITION | TOSHIBA CORP | 1989-04-03 | — | — | JP | disclosed |
| US-4769549-A | Radiation image storage panel and process for making the same | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1988-09-06 | — | — | US | disclosed |
| JP-S6254917-A | CURING OF PHOTORESIST | TOSHIBA CORP | 1987-03-10 | — | — | JP | disclosed |
| EP-0185534-A2 | Radiation image storage panel | KONICA CORPORATION (JP) | 1986-06-25 | — | — | EP | disclosed |
| JP-S56147146-A | PHOTOETCHING METHOD | FUJITSU LTD | 1981-11-14 | — | — | JP | disclosed |
| JP-S5676530-A | EXPOSURE OF RESIST | FUJITSU LTD | 1981-06-24 | — | — | JP | disclosed |
| JP-S06488447-A | — | — | 0001-01-01 | — | — | JP | disclosed |