SCHEMBL482672

SCHEMBL482672

CC(C)CN(C(=O)C(C)(C)CCl)c1ccc(F)c([Ti](C2=CC=CC2)(C2=CC=CC2)c2c(F)ccc(N(CC(C)C)C(=O)C(C)(C)CCl)c2F)c1F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5146236 0.90
SCHEMBL482977 0.86
SCHEMBL483319 0.84 RIPK1 (0.33)
SCHEMBL482739 0.83
SCHEMBL483057 0.81 RIPK1 (0.37)
SCHEMBL482976 0.80 LPAR1 (0.32)
SCHEMBL597724 0.80 BCHE (0.32)
SCHEMBL9865579 0.79
SCHEMBL482505 0.78
SCHEMBL483088 0.78

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0949540-B1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJIFILM CORP (JP) 2012-05-02 EP disclosed
EP-1249731-B1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORP (JP) 2012-04-25 EP disclosed
EP-1288720-B1 Plate-making method of printing plate FUJIFILM CORP (JP) 2012-02-01 EP disclosed
EP-1744212-B1 Photosensitive composition FUJIFILM CORP (JP) 2012-01-11 EP disclosed
EP-1834765-A2 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM Corporation (JP) 2007-09-19 EP disclosed
US-20070212641-A1 Lithographic printing plate precursor and method for preparation of lithographic printing plate FUJIFILM CORPORATION (JP) 2007-09-13 US disclosed
EP-1728838-B1 Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same FUJIFILM CORP (JP) 2007-08-15 EP disclosed
US-20070015087-A1 Photosensitive composition FUJI PHOTO FILM CO., LTD. 2007-01-18 US disclosed
EP-1744212-A2 Photosensitive composition Fuji Photo Film Co., Ltd. (JP) 2007-01-17 EP disclosed
EP-1728838-A1 Ink composition for ink jet-recording and method for preparing lithographic printing plate using the same Fuji Photo Film Co., Ltd. (JP) 2006-12-06 EP disclosed
US-6858373-B2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2005-02-22 US disclosed
US-6818372-B2 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJI PHOTO FILM CO., LTD. (JP) 2004-11-16 US disclosed
US-6727044-B1 LASER SCANNING LITHOGRAPHIC PRINTING ORIGINAL PLATE WHICH CAN PROVIDE A PRINTING PLATE HAVING A SUFFICIENTLY LONG PRESS LIFE EVEN BY HIGH-SPEED SCAN EXPOSURE AND CAUSES LITTLE FLUCTUATION IN THE PRINTING PERFORMANCE OF THE PRINTING PLATE FUJI PHOTO FILM CO., LTD. (JP) 2004-04-27 US disclosed
US-20030190554-A1 Photopolymerization; development using alkalinity developer FUJIFILM CORPORATION (JP) 2003-10-09 US disclosed
US-20030091933-A1 Photosensitive composition and negative working lithographic printing plate FUJIFILM CORPORATION (JP) 2003-05-15 US disclosed
US-20030084806-A1 FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES FUJIFILM CORPORATION (JP) 2003-05-08 US disclosed
EP-1288720-A1 Plate-making method of printing plate FUJI PHOTO FILM CO., LTD. (JP) 2003-03-05 EP disclosed
EP-1249731-A2 Photosensitive composition and negative working lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-16 EP disclosed
EP-1238801-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2002-09-11 EP disclosed
EP-0949540-A1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJI PHOTO FILM CO., LTD (JP) 1999-10-13 EP disclosed