⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL483319 | 0.94 | RIPK1 (0.33) | — | |
| SCHEMBL482505 | 0.84 | — | — | |
| SCHEMBL483195 | 0.84 | RIPK1 (0.31) | — | |
| SCHEMBL482672 | 0.83 | — | — | |
| SCHEMBL483092 | 0.83 | RIPK1 (0.31) | — | |
| SCHEMBL482515 | 0.83 | PPARG (0.31) | — | |
| SCHEMBL482535 | 0.82 | RIPK1 (0.38) | — | |
| SCHEMBL483087 | 0.82 | — | — | |
| SCHEMBL482724 | 0.81 | RIPK1 (0.35) | — | |
| SCHEMBL483322 | 0.80 | HDAC3 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1249731-B1 | Photosensitive composition and negative working lithographic printing plate | FUJIFILM CORP (JP) | 2012-04-25 | — | — | EP | disclosed |
| EP-1288720-B1 | Plate-making method of printing plate | FUJIFILM CORP (JP) | 2012-02-01 | — | — | EP | disclosed |
| EP-1744212-B1 | Photosensitive composition | FUJIFILM CORP (JP) | 2012-01-11 | — | — | EP | disclosed |
| EP-1834765-A2 | Lithographic printing plate precursor and method for preparation of lithographic printing plate | FUJIFILM Corporation (JP) | 2007-09-19 | — | — | EP | disclosed |
| US-20070212641-A1 | Lithographic printing plate precursor and method for preparation of lithographic printing plate | FUJIFILM CORPORATION (JP) | 2007-09-13 | — | — | US | disclosed |
| US-20070015087-A1 | Photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-01-18 | — | — | US | disclosed |
| EP-1744212-A2 | Photosensitive composition | Fuji Photo Film Co., Ltd. (JP) | 2007-01-17 | — | — | EP | disclosed |
| EP-1238801-B1 | Lithographic printing plate precursor | FUJI PHOTO FILM CO LTD (JP) | 2006-05-17 | — | — | EP | disclosed |
| US-6875557-B2 | Photopolymerization; development using alkalinity developer | FUJI PHOTO FILM CO., LTD. (JP) | 2005-04-05 | — | — | US | disclosed |
| US-6858373-B2 | Photosensitive composition and negative working lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2005-02-22 | — | — | US | disclosed |
| US-6818372-B2 | FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES | FUJI PHOTO FILM CO., LTD. (JP) | 2004-11-16 | — | — | US | disclosed |
| US-20030190554-A1 | Photopolymerization; development using alkalinity developer | FUJIFILM CORPORATION (JP) | 2003-10-09 | — | — | US | disclosed |
| US-20030091933-A1 | Photosensitive composition and negative working lithographic printing plate | FUJIFILM CORPORATION (JP) | 2003-05-15 | — | — | US | disclosed |
| US-20030084806-A1 | FINE PARTICLES CONTAINING A RADICAL POLYMERIZABLE ENCAPSULATED BY MICROCAPSULES | FUJIFILM CORPORATION (JP) | 2003-05-08 | — | — | US | disclosed |
| EP-1288720-A1 | Plate-making method of printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-05 | — | — | EP | disclosed |
| EP-1249731-A2 | Photosensitive composition and negative working lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-16 | — | — | EP | disclosed |
| EP-1238801-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-11 | — | — | EP | disclosed |
| US-5026625-A | Photoinitiators for polymerization of ethylenically unsaturated compounds | CIBA-GEIGY CORPORATION (US) | 1991-06-25 | — | — | US | disclosed |