SCHEMBL4829385

SCHEMBL4829385

C=C(CS)C(=O)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4829187 0.82 TSHR (0.42)
SCHEMBL35720 0.80
SCHEMBL14533248 0.80 ALDH1A1 (0.52)
SCHEMBL6065052 0.80 THRB (0.40)
SCHEMBL6392986 0.79 TSHR (0.53)
SCHEMBL36653 0.78
Methyl Alcohol SCHEMBL29084611 0.78 ALDH1A1 (0.50)
SCHEMBL323091 0.78
SCHEMBL7983922 0.76 ALDH1A1 (0.48)
SCHEMBL744097 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4201681-B1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE KONICA MINOLTA INC (JP) 2025-12-10 EP disclosed
US-20240199847-A1 RESIN COMPOSITION AND ELECTRONIC DEVICE KONICA MINOLTA INC (JP) 2024-06-20 US disclosed
US-11920019-B2 Resin composition and electronic device Konica Minolta, Inc. (JP) 2024-03-05 US disclosed
CN-114040946-B Heat curable inkjet ink 柯尼卡美能达株式会社 2023-10-13 CN disclosed
CN-116507497-A Ink jet recording method and ink jet recording apparatus 柯尼卡美能达株式会社 2023-07-28 CN disclosed
EP-4201681-A1 INKJET RECORDING METHOD AND INKJET RECORDING DEVICE KONICA MINOLTA, INC. (JP) 2023-06-28 EP disclosed
CN-112805337-B Resin composition and electronic device 柯尼卡美能达株式会社 2022-10-28 CN disclosed
CN-114040946-A Heat-curable ink-jet ink 柯尼卡美能达株式会社 2022-02-11 CN disclosed
US-20210347964-A1 RESIN COMPOSITION AND ELECTRONIC DEVICE Konica Minolta, Inc. (JP) 2021-11-11 US disclosed
CN-112805337-A Resin composition and electronic device 柯尼卡美能达株式会社 2021-05-14 CN disclosed
US-20080213692-A1 RADIATION SENSITIVE COMPOSITION, MICROLENS, PROCESS FOR FORMING THE MICROLENS AND USE OF THE MICROLENS JSR CORPORATION (JP) 2008-09-04 US disclosed
US-7374799-B2 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2008-05-20 US disclosed
US-20050157399-A1 Radiation sensitive composition, microlens, process for forming microlens and use of the microlens JSR CORPORATION (JP) 2005-07-21 US disclosed
EP-1548497-A1 Radiation sensitive composition, microlens, process for forming the microlens and use of the microlens JSR Corporation (JP) 2005-06-29 EP disclosed
EP-0382477-B1 Resin having a high refractive index TOKUYAMA CORP (JP) 1995-04-19 EP disclosed
US-5214116-A Acrylic polymers with thioester group, lenses, optical fibers, optical recording media TOKUYAMA SODA KABUSHIKI KAISHA (JP) 1993-05-25 US disclosed