SCHEMBL4830472

SCHEMBL4830472

Fc1c(F)c(F)c([B-](c2c(F)c(F)c(F)c(F)c2F)(c2c(F)c(F)c(F)c(F)c2F)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F.N#Cc1ccc(S(=O)(=O)O)cc1.N#Cc1ccc(S(=O)(=O)O)cc1.N#Cc1ccc(S(=O)(=O)O)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ CA1 P00915 4/20 0.41
▸ CA2 P00918 4/20 0.41
▸ CA12 O43570 2/20 0.41
▸ CA9 Q16790 2/20 0.41
▸ MAOA P21397 2/20 0.38
▸ MAOB P27338 2/20 0.38
▸ CYP19A1 P11511 1/20 0.37
▸ LMNA P02545 1/20 0.37
▸ PRSS1 P07477 1/20 0.36
▸ ACR P10323 1/20 0.36
▸ ALDH1A1 P00352 2/20 0.36
▸ TSHR P16473 1/20 0.36
▸ NT5E P21589 1/20 0.36
▸ KDM1A O60341 1/20 0.35
▸ NR1I2 O75469 1/20 0.35
▸ RORA P35398 1/20 0.35
▸ RORC P51449 1/20 0.35
▸ NR1H2 P55055 1/20 0.35
▸ RORB Q92753 1/20 0.35
▸ NR1H4 Q96RI1 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1894004 0.82 CA2 (0.55) CA1CA2CA12CA9MAOA
SCHEMBL4326552 0.80 CA2 (0.53) CA1CA2CA12CA9MAOA
Hydrochloric Acid SCHEMBL9662057 0.80 CA2 (0.53) CA1CA2CA12CA9MAOA
SCHEMBL4841764 0.78 GAA (0.47) CA1CA2CA12CA9LMNA
SCHEMBL4834436 0.78 ALDH1A1 (0.47) CA1CA2CA12CA9LMNA
SCHEMBL309411 0.77 CA1 (0.66) CA1CA2CA12CA9MAOA
Hydrochloric Acid SCHEMBL8880917 0.75 CA1 (0.63) CA1CA2CA12CA9MAOA
SCHEMBL6027018 0.75 CA1 (0.63) CA1CA2CA12CA9MAOA
SCHEMBL4840062 0.74 ALDH1A1 (0.41) CA1CA2CA12CA9LMNA
SCHEMBL4833814 0.74 ALDH1A1 (0.44) LMNAALDH1A1TSHRRORA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7338737-B2 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-04 — — US disclosed
US-7297452-B2 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-11-20 — — US disclosed
US-20070254221-A1 Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. SAMSUNG DISPLAY CO., LTD. (KR) 2007-11-01 — — US disclosed
US-20060141393-A1 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. 2006-06-29 — — US disclosed
US-20060131267-A1 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG DISPLAY CO., LTD. (KR) 2006-06-22 — — US disclosed
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