SCHEMBL4834436

SCHEMBL4834436

Fc1c(F)c(F)c([B-](c2c(F)c(F)c(F)c(F)c2F)(c2c(F)c(F)c(F)c(F)c2F)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F.O=S(=O)(O)c1ccc(Cl)cc1.O=S(=O)(O)c1ccc(Cl)cc1.O=S(=O)(O)c1ccc(Cl)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ ALDH1A1 P00352 3/20 0.47
▸ CYP3A4 P08684 1/20 0.47
▸ MAPK1 P28482 1/20 0.47
▸ CA1 P00915 4/20 0.44
▸ CA2 P00918 4/20 0.44
▸ MMP1 P03956 1/20 0.44
▸ MMP2 P08253 1/20 0.44
▸ MMP9 P14780 1/20 0.44
▸ MMP8 P22894 1/20 0.44
▸ MMP13 P45452 1/20 0.44
▸ LMNA P02545 1/20 0.41
▸ MEN1 O00255 1/20 0.40
▸ KMT2A Q03164 1/20 0.40
▸ CA12 O43570 3/20 0.39
▸ CA3 P07451 3/20 0.39
▸ CA4 P22748 3/20 0.39
▸ CA6 P23280 3/20 0.39
▸ CA5A P35218 3/20 0.39
▸ CA7 P43166 3/20 0.39
▸ CA9 Q16790 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4841764 0.82 GAA (0.47) ALDH1A1MAPK1CA1CA2MMP1
SCHEMBL4840062 0.81 ALDH1A1 (0.41) ALDH1A1CA1CA2LMNACA12
SCHEMBL8746207 0.80 ALDH1A1 (0.62) ALDH1A1CYP3A4MAPK1CA1CA2
SCHEMBL26836 0.80 ALDH1A1 (0.62) ALDH1A1CYP3A4MAPK1CA1CA2
SCHEMBL8477054 0.80 ALDH1A1 (0.62) ALDH1A1CYP3A4MAPK1CA1CA2
SCHEMBL506101 0.79 BRAF (0.51) ALDH1A1CYP3A4MAPK1CA1CA2
SCHEMBL4833814 0.78 ALDH1A1 (0.44) ALDH1A1CYP3A4MAPK1LMNAMEN1
SCHEMBL4830472 0.78 CA1 (0.41) ALDH1A1CA1CA2LMNACA12
SCHEMBL6908111 0.78 ALDH1A1 (0.59) ALDH1A1CYP3A4MAPK1CA1CA2
Water SCHEMBL11037456 0.78 ALDH1A1 (0.59) ALDH1A1CYP3A4MAPK1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7338737-B2 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG ELECTRONICS CO., LTD. (KR) 2008-03-04 — — US disclosed
US-7297452-B2 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. (KR) 2007-11-20 — — US disclosed
US-20070254221-A1 Akali-soluble resin, quinone diazide, surfactant mixture of a 3-perfluoroalkylpropane epoxide and polyethersilicones), and a solvent; high-quality display panels with uniformly-coated insulating layers. SAMSUNG DISPLAY CO., LTD. (KR) 2007-11-01 — — US disclosed
US-20060141393-A1 Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone SAMSUNG ELECTRONICS CO., LTD. 2006-06-29 — — US disclosed
US-20060131267-A1 Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel SAMSUNG DISPLAY CO., LTD. (KR) 2006-06-22 — — US disclosed
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