SCHEMBL4830716

SCHEMBL4830716

C=CCOC(c1ccccc1)c1ccccc1C=C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.38
KMT2A Q03164 2/20 0.38
KDM4E B2RXH2 1/20 0.38
POLB P06746 1/20 0.38
CYP2D6 P10635 3/20 0.37
CHRM2 P08172 2/20 0.37
CHRM4 P08173 2/20 0.37
CHRM5 P08912 2/20 0.37
ADRA2A P08913 2/20 0.37
CHRM1 P11229 2/20 0.37
ADRA2B P18089 2/20 0.37
CHRM3 P20309 2/20 0.37
SLC6A2 P23975 2/20 0.37
HRH2 P25021 2/20 0.37
HTR2A P28223 2/20 0.37
HTR2C P28335 2/20 0.37
SLC6A4 P31645 2/20 0.37
CYP2C19 P33261 2/20 0.37
ADRA1A P35348 2/20 0.37
HRH1 P35367 2/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11129656 0.82 MEN1 (0.46) MEN1KMT2AKDM4ECYP2D6CHRM2
SCHEMBL10624013 0.77 MEN1 (0.36) MEN1KMT2ACYP2D6HTR2ASLC6A4
SCHEMBL28026900 0.73 IDO1 (0.53) CYP2D6CHRM2ADRA2ACHRM1SLC6A2
SCHEMBL5599318 0.72 MEN1 (0.44) MEN1KMT2AKDM4ECYP2D6HTR2A
SCHEMBL19876860 0.71 ALDH1A1 (0.41) MEN1KMT2ASLC6A2SLC6A4CYP2C19
SCHEMBL3093470 0.71 MEN1 (0.46) MEN1KMT2AKDM4EHTR2ACYP2C19
SCHEMBL27490058 0.70 MEN1 (0.45) MEN1KMT2AKDM4ECYP2D6HTR2A
SCHEMBL22160163 0.70 MEN1 (0.46) MEN1KMT2ACYP2C19DRD1CYP2C9
SCHEMBL28838274 0.70 ALDH1A1 (0.40) MEN1KMT2ASLC6A2SLC6A4CYP2C19
SCHEMBL2011658 0.69 CYP2C19 (0.37) KDM4ESLC6A2HTR2ASLC6A4CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6939595-B2 Magnetic recording medium substrate using thermoplastic allyloxymethylstyrene resin, magnetic recording medium using the substrate, and method of manufacturing the magnetic recording medium FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD. (JP) 2005-09-06 US claimed
US-20040151948-A1 Magnetic recording medium substrate using thermoplastic allyloxymethylstyrene resin, magnetic recording medium using the substrate, and method of manufacturing the magnetic recording medium FUJI ELECTRIC CO., LTD. (JP) 2004-08-05 US claimed
US-7358315-B2 Thermoplastic allyloxymethylstyrene-based resin FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD. (JP) 2008-04-15 US disclosed
US-6939595-B2 Magnetic recording medium substrate using thermoplastic allyloxymethylstyrene resin, magnetic recording medium using the substrate, and method of manufacturing the magnetic recording medium FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD. (JP) 2005-09-06 US disclosed
US-20040151948-A1 Magnetic recording medium substrate using thermoplastic allyloxymethylstyrene resin, magnetic recording medium using the substrate, and method of manufacturing the magnetic recording medium FUJI ELECTRIC CO., LTD. (JP) 2004-08-05 US disclosed
US-20040106756-A1 Thermoplastic allyloxymethylstyrene-based resin FUJI ELECTRIC DEVICE TECHNOLOGY CO., LTD. (JP) 2004-06-03 US disclosed