Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.36 |
| ▸ | MEN1 | O00255 | 3/20 | 0.36 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.35 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | GPBAR1 | Q8TDU6 | 2/20 | 0.33 |
| ▸ | S1PR1 | P21453 | 1/20 | 0.31 |
| ▸ | ADRA2C | P18825 | 1/20 | 0.31 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.30 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.30 |
| ▸ | OPRD1 | P41143 | 1/20 | 0.30 |
| ▸ | NAMPT | P43490 | 2/20 | 0.30 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL267593 | 0.88 | LPAR1 (0.32) | TP53ADRA2CKDM4E | |
| SCHEMBL266308 | 0.87 | LPAR1 (0.31) | — | |
| SCHEMBL482918 | 0.87 | MLYCD (0.37) | KMT2AMEN1MAPTS1PR1ADRA2C | |
| SCHEMBL482952 | 0.86 | NPC1 (0.35) | MAPTTP53S1PR1ADRA2CNPC1 | |
| SCHEMBL483356 | 0.86 | ADRA2C (0.37) | KMT2AMEN1ADRA2COPRM1OPRD1 | |
| SCHEMBL483001 | 0.85 | TSHR (0.37) | KMT2AMEN1NPC1L3MBTL1 | |
| SCHEMBL482976 | 0.84 | LPAR1 (0.32) | — | |
| SCHEMBL482723 | 0.82 | KMT2A (0.34) | KMT2AMEN1MAPTTP53NPC1 | |
| SCHEMBL267283 | 0.81 | — | — | |
| SCHEMBL483087 | 0.81 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 53 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113168093-B | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2024-04-30 | — | — | CN | disclosed |
| CN-113383273-B | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2023-11-14 | — | — | CN | disclosed |
| CN-114402256-A | Organic film, method for producing same, composition, laminate, and semiconductor device | 富士胶片株式会社 | 2022-04-26 | — | — | CN | disclosed |
| CN-113383273-A | Photosensitive resin composition, pattern forming method, cured film, laminate, and device | 富士胶片株式会社 | 2021-09-10 | — | — | CN | disclosed |
| CN-113168093-A | Pattern forming method, photosensitive resin composition, cured film, laminate, and device | 富士胶片株式会社 | 2021-07-23 | — | — | CN | disclosed |
| US-20210197447-A1 | Method for Making an Object | PHOTOCENTRIC LIMITED (GB) | 2021-07-01 | — | — | US | disclosed |
| EP-3492982-B1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE | FUJIFILM CORP (JP) | 2020-11-11 | — | — | EP | disclosed |
| EP-3492982-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, METHOD FOR PRODUCING LAMINATE, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2019-06-05 | — | — | EP | disclosed |
| EP-3295246-B1 | METHOD FOR MAKING AN OBJECT | PHOTOCENTRIC LTD (GB) | 2019-05-01 | — | — | EP | disclosed |
| US-20180141268-A1 | Method for Making an Object | PHOTOCENTRIC LIMITED (GB) | 2018-05-24 | — | — | US | disclosed |
| EP-1249731-A2 | Photosensitive composition and negative working lithographic printing plate | FUJI PHOTO FILM CO., LTD. (JP) | 2002-10-16 | — | — | EP | disclosed |
| EP-1238801-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-0860741-B1 | Photopolymerizable composition | FUJI PHOTO FILM CO LTD (JP) | 2001-05-16 | — | — | EP | disclosed |
| EP-1091247-A2 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| US-6153660-A | VERY HIGH SENSITIVITY TO BEAMS IN THE VISIBLE REGION, PARTICULARLY TO VISIBLE RAYS AT 400 NM OR MORE SUCH AS RAYS AT 488 NM OR 532 NM CORRESPONDING TO THE OUTPUT OF AR+ LASER OR YAG-SHG LASER | FUJI PHOTO FILM CO., LTD. (JP) | 2000-11-28 | — | — | US | disclosed |
| US-6051367-A | COMPRISING ONE OR MORE ADDITION-POLYMERIZABLE ETHYLENICALLY UNSATURATED COMPOUNDS AND A SPECIFIC OXIME ETHER COMPOUND; HIGH SENSITIVE TO ACTINIC RAYS RANGING FROM ULTRAVIOLET TO VISIBLE LIGHT, IMPROVED FILM STRENGTH | FUJI PHOTO FILM CO., LTD. (JP) | 2000-04-18 | — | — | US | disclosed |
| EP-0949540-A1 | Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition | FUJI PHOTO FILM CO., LTD (JP) | 1999-10-13 | — | — | EP | disclosed |
| EP-0924570-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1999-06-23 | — | — | EP | disclosed |
| EP-0860741-A1 | Photopolymerizable composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-08-26 | — | — | EP | disclosed |
| US-5026625-A | Photoinitiators for polymerization of ethylenically unsaturated compounds | CIBA-GEIGY CORPORATION (US) | 1991-06-25 | — | — | US | disclosed |