Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP3A4 | P08684 | 6/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | MAPT | P10636 | 4/20 | 0.38 |
| ▸ | MEN1 | O00255 | 3/20 | 0.38 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.38 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.38 |
| ▸ | POLB | P06746 | 2/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.38 |
| ▸ | BLM | P54132 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | THRB | P10828 | 1/20 | 0.38 |
| ▸ | APEX1 | P27695 | 1/20 | 0.38 |
| ▸ | RECQL | P46063 | 1/20 | 0.38 |
| ▸ | MCL1 | Q07820 | 1/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.38 |
| ▸ | TSHR | P16473 | 5/20 | 0.35 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.35 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.35 |
| ▸ | IMPDH2 | P12268 | 1/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29987755 | 1.00 | CYP3A4 (0.39) | CYP3A4ALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL11680707 | 0.84 | GAA (0.44) | CYP3A4ALDH1A1MAPTTDP1THRB | |
| SCHEMBL11228666 | 0.84 | CYP3A4 (0.44) | CYP3A4ALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL11678925 | 0.84 | GAA (0.44) | CYP3A4ALDH1A1MAPTTDP1THRB | |
| SCHEMBL9701629 | 0.83 | CYP3A4 (0.50) | CYP3A4ALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL17069845 | 0.80 | ALDH1A1 (0.35) | CYP3A4ALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL21852155 | 0.80 | POLB (0.40) | CYP3A4ALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL11678565 | 0.80 | CYP3A4 (0.38) | CYP3A4ALDH1A1TDP1THRBRECQL | |
| SCHEMBL526351 | 0.80 | ALDH1A1 (0.50) | CYP3A4ALDH1A1MAPTMEN1KMT2A | |
| SCHEMBL11412578 | 0.78 | ALDH1A1 (0.34) | CYP3A4ALDH1A1MAPTMEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1556 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4098400-B1 | POLISHING PAD AND METHOD FOR PREPARING A SEMICONDUCTOR DEVICE USING THE SAME | ENPULSE CO LTD (KR) | 2026-04-22 | — | — | EP | claimed |
| US-20260091462-A1 | PAD FOR CHEMICAL MECHANICAL POLISHING | DUPONT ELECTRONIC MAT HOLDING INC (US) | 2026-04-02 | — | — | US | claimed |
| US-12570029-B2 | Method for manufacturing polishing pad window, and polishing pad window manufactured thereby | KPX Chemical Co., Ltd (KR) | 2026-03-10 | — | — | US | claimed |
| US-12515295-B2 | Polishing pad and method for preparing a semiconductor device using the same | ENPULSE CO., LTD. (KR) | 2026-01-06 | — | — | US | claimed |
| US-20250250460-A1 | COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS | BERTECH PANAMA S.A. (PA) | 2025-08-07 | — | — | US | claimed |
| US-20250222556-A1 | PAD FOR CHEMICAL MECHANICAL POLISHING | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2025-07-10 | — | — | US | claimed |
| EP-4467286-A1 | METHOD FOR MANUFACTURING POLISHING PAD WINDOW, AND POLISHING PAD WINDOW MANUFACTURED THEREBY | KPX Chemical Co., Ltd. (KR) | 2024-11-27 | — | — | EP | claimed |
| US-20240367356-A1 | METHOD FOR MANUFACTURING POLISHING PAD WINDOW, AND POLISHING PAD WINDOW MANUFACTURED THEREBY | KPX CHEMICAL CO., LTD. (KR) | 2024-11-07 | — | — | US | claimed |
| WO-2024052724-A1 | COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS | BERTECH PANAMÁ S.A. (PA) | 2024-03-14 | — | — | WO | claimed |
| CN-117396308-A | Method of manufacturing a polishing pad window and polishing pad window manufactured thereby | 韩商KPX化学股份有限公司 | 2024-01-12 | — | — | CN | claimed |
| US-5312651-A | Using varnish from /1/ brominated 3-functional epoxy resin consisting of bisphenol A epoxy resin, specified triglycidyl ether, tetrabromobisphenol A, /2/ dicyandiamide and chloro diaminodiphenylmethane curing agent, /3/ an imidazole catalyst | MATSUSHITA ELECTRIC WORKS, LTD. (JP) | 1994-05-17 | — | — | US | claimed |
| EP-0579989-A1 | Polyurethaneurea elastomer | IHARA CHEMICAL INDUSTRY Co., Ltd. (JP) | 1994-01-26 | — | — | EP | claimed |
| EP-0279376-B1 | Process for producing polyurea resin | IHARA CHEMICAL IND CO (JP) | 1993-11-03 | — | — | EP | claimed |
| US-5039775-A | Process for producing polyurea resin | IHARA CHEMICAL INDUSTRY CO., LTD. (JP) | 1991-08-13 | — | — | US | claimed |
| EP-0161576-B1 | EPOXY RESIN COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1990-07-04 | — | — | EP | claimed |
| US-4869961-A | NONTOXIC HANDLING | IHARA CHEMICAL IND. CO., LTD. (JP) | 1989-09-26 | — | — | US | claimed |
| US-4663401-A | POLYSULFONE POLYETHER BLEND WITH DIAMINE CURING AGENT | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1987-05-05 | — | — | US | claimed |
| EP-0161576-A2 | Epoxy resin composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1985-11-21 | — | — | EP | claimed |
| US-4327204-A | Process for producing polyurethane elastomer by mixing a hardener composition with an isocyanate composition | IHARA CHEMICAL INDUSTRY CO., LTD. (JP) | 1982-04-27 | — | — | US | claimed |
| US-4107151-A | FROM POLYISOCYANATE, CHAIN POLYOL, AROMATIC DIAMINE, POLYOL OR AMINO ALCOHOL WITH URETHANE BOND | IHARA CHEMICAL COMPANY CO., LTD. (JP) | 1978-08-15 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260091462-A1 | PAD FOR CHEMICAL MECHANICAL POLISHING | PCNA, PUF60, PADI2 | CYP3A4 4807/4885ALDH1A1 2050/4885MAPT 1411/4885 |
| US-12570029-B2 | Method for manufacturing polishing pad window, and polishing pad window manufactured thereby | PRKDC, PRKACB, PRKX | CYP3A4 3717/4885ALDH1A1 2177/4885MAPT 2174/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.