Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 2/20 | 0.50 |
| ▸ | TSHR | P16473 | 6/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 5/20 | 0.46 |
| ▸ | ATM | Q13315 | 1/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.41 |
| ▸ | CA2 | P00918 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 3/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.39 |
| ▸ | MMP9 | P14780 | 1/20 | 0.38 |
| ▸ | MMP8 | P22894 | 1/20 | 0.38 |
| ▸ | MMP14 | P50281 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.38 |
| ▸ | PRSS1 | P07477 | 1/20 | 0.37 |
| ▸ | PRSS2 | P07478 | 1/20 | 0.37 |
| ▸ | PRSS3 | P35030 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 1/20 | 0.36 |
| ▸ | HTT | P42858 | 1/20 | 0.36 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Di(Hydroxyethyl)Ether SCHEMBL1493257 | 0.95 | TSHR (0.51) | THRBTSHRCYP3A4ATMTDP1 | |
| Ether SCHEMBL1982684 | 0.90 | TSHR (0.51) | THRBTSHRCYP3A4ATMTDP1 | |
| SCHEMBL5452604 | 0.89 | THRB (0.48) | THRBTSHRCYP3A4ATMTDP1 | |
| SCHEMBL4965587 | 0.89 | THRB (0.48) | THRBTSHRCYP3A4ATMTDP1 | |
| SCHEMBL4156804 | 0.88 | TSHR (0.52) | THRBTSHRCYP3A4ATMTDP1 | |
| Ether SCHEMBL18091197 | 0.88 | TSHR (0.55) | THRBTSHRCYP3A4ATMTDP1 | |
| Diethylene Glycol Monoethyl Ether SCHEMBL11221779 | 0.87 | TSHR (0.50) | THRBTSHRCYP3A4ATMTDP1 | |
| Ethylene Glycol SCHEMBL5819613 | 0.87 | TSHR (0.56) | TSHRCYP3A4ATMTDP1ALDH1A1 | |
| SCHEMBL1269088 | 0.85 | TSHR (0.61) | TSHRCYP3A4ATMTDP1ALDH1A1 | |
| SCHEMBL16772 | 0.85 | TSHR (0.61) | TSHRCYP3A4ATMTDP1ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 45 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230416522-A1 | ACRYLATE-EPOXY RESIN COMPOSITIONS | LYONDELLBASELL COMPOSITES LLC (US) | 2023-12-28 | — | — | US | disclosed |
| WO-2023225151-A1 | ACRYLATE-EPOXY RESIN COMPOSITIONS | LYONDELLBASELL COMPOSITES LLC (US) | 2023-11-23 | — | — | WO | disclosed |
| EP-3018118-B1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| CN-111752099-B | Photosensitive resin composition, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2022-03-22 | — | — | CN | disclosed |
| CN-112698547-B | Photo-curing composition and application thereof | 常州强力电子新材料股份有限公司 | 2022-02-22 | — | — | CN | disclosed |
| US-11054743-B2 | Fluorene polyfunctional photoinitiator and preparation and use thereof, and photosensitive resin composition containing fluorene photoinitiator and use thereof | CHANGZHOU TRONLY ADVANCED ELECTRONIC MATERIALS CO., LTD. (CN) | 2021-07-06 | — | — | US | disclosed |
| CN-112698547-A | Photo-curing composition and application thereof | 常州强力电子新材料股份有限公司 | 2021-04-23 | — | — | CN | disclosed |
| EP-3392232-B1 | FLUORENE MULTIFUNCTIONAL PHOTOINITIATOR AND PREPARATION AND USE THEREOF, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING FLUORENE PHOTOINITIATOR AND USE THEREOF | CHANGZHOU TRONLY ADVANCED ELECTRONIC MAT CO LTD (CN) | 2021-02-17 | — | — | EP | disclosed |
| CN-107848963-B | Acid-resistant alkali-producing agent and/or radical-producing agent, and curable resin composition containing same | 富士胶片和光纯药株式会社 | 2020-11-03 | — | — | CN | disclosed |
| CN-111752099-A | Photosensitive resin composition, application thereof, color filter and image display device | 常州强力电子新材料股份有限公司 | 2020-10-09 | — | — | CN | disclosed |
| CN-1975574-A | Radiation sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2007-06-06 | — | — | CN | disclosed |
| CN-1841195-A | X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof, and liquid crystal display element | JSR CORP (JP) | 2006-10-04 | — | — | CN | disclosed |
| CN-1808273-A | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG ELECTRONICS CO LTD (KR) | 2006-07-26 | — | — | CN | disclosed |
| US-20060141393-A1 | Alkali-soluble resin; a quinone diazide; and a mixture of surfactants including a 3-(perfluoroalkyl)-1,2-epoxypropane, reaction product between methylhydrobis(trimethylsiloxy)silane and polyalkylene glycol monoallyl ether preferably having a molecular weight from 200 to 500 and a 2nd ether silicone | SAMSUNG ELECTRONICS CO., LTD. | 2006-06-29 | — | — | US | disclosed |
| US-20060131267-A1 | Photosensitive resin composition, thin film panel made with photosensitive resin composition, and method for manufacturing thin film panel | SAMSUNG DISPLAY CO., LTD. (KR) | 2006-06-22 | — | — | US | disclosed |
| CN-1716095-A | Radiation sensitive resin composition, cured resin and liquid crystal display device | SUMITOMO CHEM ENG (JP) | 2006-01-04 | — | — | CN | disclosed |
| CN-1716094-A | Radiation sensitive resin composition | SUMITOMO CHEM ENG (JP) | 2006-01-04 | — | — | CN | disclosed |
| US-6900250-B2 | Polymerizable composition | TOYO INK MFG. CO., LTD. (JP) | 2005-05-31 | — | — | US | disclosed |
| CN-1542548-A | Radiation-sensitive resin composition | 住友化学工业株式会社 | 2004-11-03 | — | — | CN | disclosed |
| US-20030212162-A1 | Photopolymerization using photoinitiators | TOYO INK MFG. CO., LTD. (JP) | 2003-11-13 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11054743-B2 | Fluorene polyfunctional photoinitiator and preparation and use thereof, and photosensitive resin composition containing fluorene photoinitiator and use thereof | RARA, RARG, PFAS | THRB 3544/4885TSHR 1765/4885CYP3A4 1997/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.