SCHEMBL4837762

SCHEMBL4837762

CC(C)(C)CC(OC(CC(C)(C)C)c1ccco1)c1ccco1

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC6A2 P23975 1/20 0.35
SLC6A4 P31645 1/20 0.35
KMT2A Q03164 5/20 0.33
POLB P06746 3/20 0.33
L3MBTL1 Q9Y468 2/20 0.33
PKM P14618 1/20 0.33
PTPN1 P18031 1/20 0.33
PTPN7 P35236 1/20 0.33
BLM P54132 1/20 0.33
ESR2 Q92731 1/20 0.33
MAPT P10636 4/20 0.33
MEN1 O00255 4/20 0.33
ALDH1A1 P00352 4/20 0.33
KDM4E B2RXH2 2/20 0.33
TDP1 Q9NUW8 1/20 0.33
TP53 P04637 1/20 0.32
ALOX5 P09917 1/20 0.32
CYP2C19 P33261 2/20 0.31
HPGD P15428 3/20 0.31
HSD17B10 Q99714 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1152090 0.78 SLC6A2 (0.38) SLC6A2SLC6A4KMT2APOLBL3MBTL1
SCHEMBL14062942 0.76 ALOX5 (0.37) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL17829523 0.74 KMT2A (0.42) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL20993285 0.74 ALOX5 (0.36) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL13672226 0.72 SLC6A2 (0.35) SLC6A2SLC6A4KMT2APOLBL3MBTL1
SCHEMBL1287682 0.72 KMT2A (0.38) SLC6A2SLC6A4KMT2APOLBL3MBTL1
SCHEMBL44855 0.69 POLB (0.36) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL1153254 0.69 TSHR (0.47) SLC6A2SLC6A4KMT2APOLBL3MBTL1
SCHEMBL12437162 0.69 HPGD (0.37) KMT2APOLBL3MBTL1PKMPTPN1
SCHEMBL20993510 0.69 TSHR (0.38) KMT2APOLBL3MBTL1PKMPTPN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7399697-B2 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. (US) 2008-07-15 US claimed
US-20050136240-A1 Very low dielectric constant plasma-enhanced CVD films MANDAL ROBERT P (US) 2005-06-23 US claimed
US-20020142585-A1 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. 2002-10-03 US claimed
US-7399697-B2 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. (US) 2008-07-15 US disclosed
US-20050136240-A1 Very low dielectric constant plasma-enhanced CVD films MANDAL ROBERT P (US) 2005-06-23 US disclosed
US-6890639-B2 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. (US) 2005-05-10 US disclosed
US-20020142585-A1 Very low dielectric constant plasma-enhanced CVD films APPLIED MATERIALS, INC. 2002-10-03 US disclosed