SCHEMBL4849500

SCHEMBL4849500

OC1(C=Cc2ccccc2)CCCCC1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAOB P27338 1/20 0.39
HDAC4 P56524 2/20 0.38
HDAC3 O15379 1/20 0.38
TNKS O95271 1/20 0.38
HDAC1 Q13547 1/20 0.38
HCAR2 Q8TDS4 1/20 0.38
HDAC7 Q8WUI4 1/20 0.38
HDAC2 Q92769 1/20 0.38
HDAC10 Q969S8 1/20 0.38
HDAC11 Q96DB2 1/20 0.38
HDAC8 Q9BY41 1/20 0.38
TNKS2 Q9H2K2 1/20 0.38
HDAC6 Q9UBN7 1/20 0.38
HDAC9 Q9UKV0 1/20 0.38
HDAC5 Q9UQL6 1/20 0.38
PLIN1 O60240 1/20 0.38
ALDH1A1 P00352 1/20 0.38
LMNA P02545 1/20 0.38
CYP1A2 P05177 1/20 0.38
CYP2D6 P10635 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28322059 0.94 MAOB (0.41) MAOBHDAC4HDAC3TNKSHDAC1
SCHEMBL28453323 0.90 MAOB (0.44) MAOBHDAC4HDAC3TNKSHDAC1
SCHEMBL5236717 0.81 OPRM1 (0.42) MAOBHDAC4HDAC3TNKSHDAC1
SCHEMBL5236707 0.81 OPRM1 (0.42) MAOBHDAC4HDAC3TNKSHDAC1
SCHEMBL27671637 0.79 AKR1C1 (0.36) HDAC4
SCHEMBL14831854 0.77 AKR1C1 (0.38) HDAC4ALDH1A1
SCHEMBL28043030 0.77 HMGCR (0.34) ALDH1A1SMN1; SMN2
SCHEMBL20484201 0.73 ALDH1A1 (0.37) MAOBALDH1A1MAPTMEN1KMT2A
SCHEMBL27671619 0.72 ALDH1A1 (0.33) MAOBHDAC4HDAC3TNKSHDAC1
Styrene SCHEMBL27471210 0.71 ALDH1A1 (0.48) HDAC4ALDH1A1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-101316683-B Method for manufacturing microporous cmp materials having controlled pore size CABOT MICROELECTRONICS CORP 2010-12-29 CN disclosed
CN-101316683-A Method for manufacturing microporous cmp materials having controlled pore size CABOT MICROELECTRONICS CORP (US) 2008-12-03 CN disclosed
EP-1963048-A1 METHOD FOR MANUFACTURING MICROPOROUS CMP MATERIALS HAVING CONTROLLED PORE SIZE CABOT MICROELECTRONICS CORPORATION (US) 2008-09-03 EP disclosed
US-20080057845-A1 Method for manufacturing microporous CMP materials having controlled pore size CABOT MICROELECTRONICS CORPORATION 2008-03-06 US disclosed
US-7311862-B2 Method for manufacturing microporous CMP materials having controlled pore size CABOT MICROELECTRONICS CORPORATION (US) 2007-12-25 US disclosed
WO-2007055901-A1 METHOD FOR MANUFACTURING MICROPOROUS CMP MATERIALS HAVING CONTROLLED PORE SIZE CABOT MICROELECTRONICS CORPORATION (US) 2007-05-18 WO disclosed
US-20060052040-A1 Method for manufacturing microporous CMP materials having controlled pore size CABOT MICROELECTRONICS CORPORATION 2006-03-09 US disclosed