SCHEMBL4850356

SCHEMBL4850356

CC(C)(O)c1ccc(C(C)(C)c2ccc(C(C)(C)O)cc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.60
ESR2 Q92731 3/20 0.60
CYP3A4 P08684 3/20 0.60
TSHR P16473 3/20 0.60
HPGD P15428 3/20 0.60
HSD17B10 Q99714 3/20 0.60
AR P10275 1/20 0.60
SLC6A2 P23975 1/20 0.60
SLC6A4 P31645 1/20 0.60
HTR6 P50406 1/20 0.60
ESRRG P62508 1/20 0.60
SLC6A3 Q01959 1/20 0.60
ALDH1A1 P00352 3/20 0.50
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
HSD11B1 P28845 1/20 0.39
LMNA P02545 1/20 0.39
TYR P14679 1/20 0.39
KLF10 Q13118 1/20 0.38
ALOX15 P16050 3/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL196799 0.90 MEN1 (0.48) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL548389 0.89 ESR1 (0.67) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL19792143 0.89 ESR1 (0.80) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL6933899 0.81 ESR1 (0.50) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL10620533 0.81 LMNA (0.60) TSHRHPGDHSD17B10ALDH1A1MEN1
SCHEMBL18802754 0.81 KIF11 (0.44) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL8985984 0.81 MEN1 (0.42) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL8007516 0.81 ESR1 (0.60) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL547767 0.81 KIF11 (0.44) ESR1ESR2CYP3A4TSHRHPGD
SCHEMBL858049 0.79 TSHR (0.60) ESR1ESR2CYP3A4TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10934414-B2 Long film, long polarizing plate, liquid crystal display device, and method for manufacturing long film FUJIFILM CORPORATION (JP) 2021-03-02 US disclosed
US-7323284-B2 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2008-01-29 US disclosed
EP-0911153-B1 Image forming method KONISHIROKU PHOTO IND (JP) 2003-12-10 EP disclosed
US-20030022095-A1 Negative type radiation sensitive resin composition JSR CORPORATION (JP) 2003-01-30 US disclosed
EP-0911153-A1 Image forming method KONICA CORPORATION (JP) 1999-04-28 EP disclosed