Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KIF11 | P52732 | 4/20 | 0.44 |
| ▸ | MEN1 | O00255 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | TNKS | O95271 | 9/20 | 0.41 |
| ▸ | PARP1 | P09874 | 9/20 | 0.41 |
| ▸ | TNKS2 | Q9H2K2 | 9/20 | 0.41 |
| ▸ | CDC7 | O00311 | 1/20 | 0.41 |
| ▸ | PLK4 | O00444 | 1/20 | 0.41 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.41 |
| ▸ | AURKA | O14965 | 1/20 | 0.41 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.41 |
| ▸ | JAK2 | O60674 | 1/20 | 0.41 |
| ▸ | MAP4K4 | O95819 | 1/20 | 0.41 |
| ▸ | PAK4 | O96013 | 1/20 | 0.41 |
| ▸ | CHEK2 | O96017 | 1/20 | 0.41 |
| ▸ | ABL1 | P00519 | 1/20 | 0.41 |
| ▸ | LCK | P06239 | 1/20 | 0.41 |
| ▸ | FYN | P06241 | 1/20 | 0.41 |
| ▸ | CDK1 | P06493 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18802754 | 1.00 | KIF11 (0.44) | KIF11MEN1KMT2ACYP2C9TNKS | |
| SCHEMBL17752217 | 0.92 | KIF11 (0.56) | KIF11KMT2ALMNATYRHPGD | |
| SCHEMBL13694443 | 0.92 | KIF11 (0.44) | KIF11MEN1KMT2ACYP2C9TNKS | |
| SCHEMBL196799 | 0.90 | MEN1 (0.48) | MEN1KMT2ATNKSPARP1TNKS2 | |
| SCHEMBL429422 | 0.89 | CYP2C9 (0.56) | KIF11KMT2ACYP2C9TNKSPARP1 | |
| SCHEMBL4506291 | 0.89 | CYP2C9 (0.56) | KIF11KMT2ACYP2C9TNKSPARP1 | |
| SCHEMBL17754362 | 0.89 | TSHR (0.52) | KIF11TNKSPARP1TNKS2CDC7 | |
| SCHEMBL10781469 | 0.89 | ESR1 (0.56) | KIF11ABL1SLC6A3LMNATYR | |
| SCHEMBL547711 | 0.87 | RXRB (0.47) | KIF11TNKSPARP1TNKS2CDC7 | |
| SCHEMBL13974830 | 0.85 | EGFR (0.44) | KIF11MEN1KMT2ACDC7PLK4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 143 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090291988-A1 | Reversible Inhibitors of Monoamine Oxidase A and B | MERCK FROSST CANADA LTD. (CA) | 2009-11-26 | — | — | US | claimed |
| EP-1893562-A1 | REVERSIBLE INHIBITORS OF MONOAMINE OXIDASE A AND B | Merck Frosst Canada Ltd. (CA) | 2008-03-05 | — | — | EP | claimed |
| WO-2006133559-A1 | REVERSIBLE INHIBITORS OF MONOAMINE OXIDASE A AND B | MERCK FROSST CANADA LTD. (CA) | 2006-12-21 | — | — | WO | claimed |
| EP-0267761-B1 | PREPARATION PROCESS OF 4,4'-DIHYDROXYBIPHENYL | KUREHA KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1992-01-29 | — | — | EP | claimed |
| US-RE33779-E | Hydrogen peroxide decomposition of 4,4*-di(2-hydroxypropyl)-biphenyl | KUREHA KAGAKU KOGYO K.K. (JP) | 1991-12-24 | — | — | US | claimed |
| US-4804788-A | Preparation process of 4,4-dihydroxybiphenyl | KUREHA KAGAKU KOGYO K.K. (JP) | 1989-02-14 | — | — | US | claimed |
| JP-2250841-A | — | — | None | — | — | JP | disclosed |
| JP-63119432-A | — | — | None | — | — | JP | disclosed |
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-12-26 | — | — | US | disclosed |
| US-20230272156-A1 | CURABLE RESIN, CURABLE RESIN COMPOSITION, AND CURED PRODUCT | DIC CORPORATION (JP) | 2023-08-31 | — | — | US | disclosed |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2022-02-08 | — | — | US | disclosed |
| EP-3062151-B1 | RESIST COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYPHENOLIC COMPOUND FOR USE IN THE COMPOSITION, AND ALCOHOLIC COMPOUND THAT CAN BE DERIVED THEREFROM | MITSUBISHI GAS CHEMICAL CO (JP) | 2021-05-05 | — | — | EP | disclosed |
| JP-H02250841-A | PRODUCTION OF 4,4'-DIHYDROXYBIPHENYL | MITSUI PETROCHEM IND LTD | 1990-10-08 | — | — | JP | disclosed |
| US-4925916-A | FROM DIAMINES OR TETRACARBOXY ACIDS CONTAINING AROMATIC RINGS BRIDGED BY ISOALKYLIDENE GROUPS | AMOCO CORPORATION (US) | 1990-05-15 | — | — | US | disclosed |
| US-4825007-A | Oxidation process of aromatic compounds | KUREHA KAGAKU KOGYO K.K. (JP) | 1989-04-25 | — | — | US | disclosed |
| US-4804788-A | Preparation process of 4,4-dihydroxybiphenyl | KUREHA KAGAKU KOGYO K.K. (JP) | 1989-02-14 | — | — | US | disclosed |
| US-4804788-A | Preparation process of 4,4-dihydroxybiphenyl | KUREHA KAGAKU KOGYO K.K. (JP) | 1989-02-14 | — | — | US | disclosed |
| JP-S63119432-A | PRODUCTION OF 4,4-DIHYDROXYBIPHENYL | KUREHA CHEM IND CO LTD | 1988-05-24 | — | — | JP | disclosed |
| US-4713438-A | Amide and/or imide containing polymers and monomers for the preparation thereof | AMOCO CORPORATION (US) | 1987-12-15 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11852970-B2 | Material for lithography, production method therefor, composition for lithography, pattern formation method, compound, resin, and method for purifying the compound or the resin | SLC39A11, CROCC, TERB1 | KIF11 682/4885MEN1 1260/4885KMT2A 2526/4885 |
| US-11572430-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | KIF11 3842/4885MEN1 1512/4885KMT2A 633/4885 |
| US-20090291988-A1 | Reversible Inhibitors of Monoamine Oxidase A and B | MAOB, MAOA, XDH | KIF11 4535/4885MEN1 2309/4885KMT2A 1144/4885 |
| US-11243467-B2 | Compound, resin, resist composition or radiation-sensitive composition, resist pattern formation method, method for producing amorphous film, underlayer film forming material for lithography, composition for underlayer film formation for lithography, method for forming circuit pattern, and purification method | C9, C5, C1R | KIF11 3842/4885MEN1 1512/4885KMT2A 633/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.