SCHEMBL4853542

SCHEMBL4853542

CCCCCCCCCCCC(=O)OC(=O)CC(C(=O)NC(C)O)S(=O)(=O)O.[NaH].[NaH]

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 3/20 0.40
LMNA P02545 4/20 0.40
MAPK1 P28482 4/20 0.37
MEN1 O00255 3/20 0.37
KMT2A Q03164 3/20 0.37
RECQL P46063 1/20 0.37
FAAH O00519 1/20 0.37
KDM4E B2RXH2 1/20 0.36
DUSP3 P51452 1/20 0.36
DGKA P23743 1/20 0.36
CA12 O43570 1/20 0.35
CA2 P00918 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA14 Q9ULX7 1/20 0.35
CYP1A2 P05177 2/20 0.35
GMNN O75496 1/20 0.35
HSP90AA1 P07900 1/20 0.35
BLM P54132 1/20 0.35
NPSR1 Q6W5P4 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3824079 0.99 MAPT (0.41) MAPTLMNAMAPK1MEN1KMT2A
SCHEMBL9344754 0.86 FAAH (0.51) FAAHDGKA
SCHEMBL5516336 0.86 ALDH1A1 (0.45) MAPTLMNARECQL
SCHEMBL3465910 0.85 FAAH (0.52) FAAHDGKA
SCHEMBL3084715 0.84 FAAH (0.40) MAPTLMNAMAPK1MEN1KMT2A
SCHEMBL393940 0.84 ALDH1A1 (0.46) MAPTLMNARECQLTSHR
SCHEMBL27547997 0.83 DGKA (0.46) MAPTLMNAMAPK1MEN1KMT2A
SCHEMBL28399581 0.81 DGKA (0.47) MAPTLMNAMAPK1MEN1KMT2A
SCHEMBL9157173 0.81 DGKA (0.47) MAPTLMNAMAPK1MEN1KMT2A
SCHEMBL4959012 0.80 RECQL (0.47) MAPTLMNAMAPK1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2024009754-A1 SURFACTANT COMPOSITION AND CLEANING AGENT 三洋化成工業株式会社 2024-01-11 WO disclosed
US-7361712-B2 Water absorbing agent, process for its production, and absorbers and absorbent articles made by using the agent SAN-DIA POLYMERS, LTD. (JP) 2008-04-22 US disclosed
US-20070269987-A1 Polishing Liquid for Cmp Process and Polishing Method SANYO CHEMICAL INDUSTRIES, LTD. (JP) 2007-11-22 US disclosed
EP-1628334-A1 POLISHING LIQUID FOR CMP PROCESS AND POLISHING METHOD SANYO CHEMICAL INDUSTRIES LTD. (JP) 2006-02-22 EP disclosed
US-20050080194-A1 Water absorbing agent, process for its production, and absorbers and absorbent articles made by using the agent SAN-DIA POLYMERS, LTD. (JP) 2005-04-14 US disclosed
EP-1457541-A1 WATER ABSORBING AGENT, PROCESS FOR ITS PRODUCTION, AND ABSORBERS AND ABSORBENT ARTICLES MADE BY USING THE AGENT San-Dia Polymers, Ltd. (JP) 2004-09-15 EP disclosed