Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TP53 | P04637 | 1/20 | 0.36 |
| ▸ | CALM1 | P0DP23 | 1/20 | 0.33 |
| ▸ | TAAR1 | Q96RJ0 | 3/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.32 |
| ▸ | TSHR | P16473 | 3/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.31 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.31 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.31 |
| ▸ | MAPT | P10636 | 1/20 | 0.31 |
| ▸ | IDO1 | P14902 | 1/20 | 0.31 |
| ▸ | LOXL2 | Q9Y4K0 | 1/20 | 0.31 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.31 |
| ▸ | MAOA | P21397 | 1/20 | 0.30 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.30 |
| ▸ | SLC6A4 | P31645 | 1/20 | 0.30 |
| ▸ | SLC6A3 | Q01959 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1127762 | 0.91 | TP53 (0.42) | TP53CALM1TAAR1ALDH1A1TSHR | |
| SCHEMBL4852324 | 0.87 | MMP3 (0.42) | TDP1MEN1KMT2ASLC6A2SLC6A3 | |
| SCHEMBL9241379 | 0.84 | LTA4H (0.49) | ACHEALDH1A1KDM4ETDP1MEN1 | |
| SCHEMBL390922 | 0.80 | TP53 (0.40) | TP53CALM1TAAR1ALDH1A1TSHR | |
| SCHEMBL8757718 | 0.80 | TP53 (0.40) | TP53CALM1TAAR1ALDH1A1TSHR | |
| SCHEMBL13400453 | 0.79 | HTT (0.42) | TP53ACHEALDH1A1TSHRKDM4E | |
| SCHEMBL9357293 | 0.78 | CALM1 (0.36) | TP53CALM1TAAR1ALDH1A1TSHR | |
| SCHEMBL5693416 | 0.78 | TSHR (0.39) | TP53CALM1TAAR1ALDH1A1TSHR | |
| SCHEMBL9241421 | 0.78 | GAA (0.47) | ALDH1A1TSHRKDM4ETDP1MAPT | |
| SCHEMBL13146728 | 0.78 | CYP1A2 (0.43) | TAAR1ALDH1A1TSHRTDP1MAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7371500-B2 | Positive photosensitive insulating resin composition and cured product thereof | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | claimed |
| US-20070166632-A1 | POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR CORPORATION (JP) | 2007-07-19 | — | — | US | claimed |
| EP-1469346-B1 | POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED OBJECT OBTAINED THEREFROM | JSR CORP (JP) | 2015-08-05 | — | — | EP | disclosed |
| US-7371500-B2 | Positive photosensitive insulating resin composition and cured product thereof | JSR CORPORATION (JP) | 2008-05-13 | — | — | US | disclosed |
| US-20070166632-A1 | POSITIVE PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED PRODUCT THEREOF | JSR CORPORATION (JP) | 2007-07-19 | — | — | US | disclosed |
| US-7214454-B2 | Positively photosensitive insulating resin composition and cured object obtained therefrom | JSR CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7015256-B2 | Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same | JSR CORPORATION (JP) | 2006-03-21 | — | — | US | disclosed |
| EP-1471540-A1 | COMPOSITION FOR FORMING PHOTOSENSITIVE DIELECTRIC MATERIAL, AND TRANSFER FILM, DIELECTRIC MATERIAL AND ELECTRONIC PARTS USING THE SAME | JSR Corporation (JP) | 2004-10-27 | — | — | EP | disclosed |
| EP-1469346-A1 | POSITIVELY PHOTOSENSITIVE INSULATING RESIN COMPOSITION AND CURED OBJECT OBTAINED THEREFROM | JSR Corporation (JP) | 2004-10-20 | — | — | EP | disclosed |
| US-20040126696-A1 | Positively photosensitive insulating resin composition and cured object obtained therefrom | JSR CORPORATION (JP) | 2004-07-01 | — | — | US | disclosed |
| US-20040094752-A1 | Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same | JSR CORPORATION (JP) | 2004-05-20 | — | — | US | disclosed |